Simulation of Atomic Diffusion in the Fcc NiAl System: A Kinetic Monte Carlo Study

被引:12
|
作者
Alfonso, Dominic R. [1 ]
Tafen, De Nyago [1 ,2 ]
机构
[1] US DOE, Natl Energy Technol Lab, Pittsburgh, PA 15241 USA
[2] URS Corp, Albany, OR 97321 USA
来源
JOURNAL OF PHYSICAL CHEMISTRY C | 2015年 / 119卷 / 21期
关键词
TOTAL-ENERGY CALCULATIONS; MOLECULAR-DYNAMICS; SOLUTE DIFFUSION; SELF-DIFFUSION; NICKEL; 1ST-PRINCIPLES; ALLOYS; NI3AL; VACANCIES; MECHANISM;
D O I
10.1021/acs.jpcc.5b00733
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The atomic diffusion in fcc NiAl binary alloys was Studied by kinetic Monte Carlo simulation. The environment dependent hopping barriers were computed using a pair interaction model whose parameters were fitted to relevant data derived from electronic structure calculations. Long time diffusivities were calculated and the effect of composition change on the tracer diffusion coefficients was analyzed. Our results indicate that this variation has noticeable impact on the atomic diffusivities. A clear reduction: in the mobility of both Ni and Al is demonstrated with increasing Al content. Examination of the pair interaction between atoms was carried out for the purpose of understanding the predicted trends.
引用
收藏
页码:11809 / 11817
页数:9
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