Preparation and service performance characterization of Ni/PMN-PT: Effect of preparation temperature

被引：4
作者：
Fang, Xue-Qian [1 ]
Bai, Guang-Xi [1 ]
机构：
[1] Shijiazhuang Tiedao Univ, Dept Engn Mech, Shijiazhuang 050043, Hebei, Peoples R China
来源：
JOURNAL OF ALLOYS AND COMPOUNDS | 2018年 / 735卷
关键词：
Ni/PMN-PT film; DC megnetron sputtering; Magnetoelectric properties; Adhesion strength; THIN-FILMS; ELECTRIC-FIELD;
D O I：
10.1016/j.jallcom.2017.11.228
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Ni/PMN-PT thin films were prepared by DC megnetron sputtering, and different sputtering temperatures were applied. The crystalline micro-structure and morphology were characterized by XRD, EDS, VSM and SEM. The magneto-electric properties and adhesion strength were measured by force-magneto-electric measurement system and Nano Test Vantage system. The magnetic hystersis loops indicated that the thin film expressed obvious electric-field modulation effect on magnetic properties. By adjusting the sputtering temperature, the crystalline and magnetic properties in Ni/PMN-PT thin film can be improved significantly. In addition, the scratch behavior showed that the critical load values for cracking and failure were significantly related with the sputtering temperature. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码：1131 / 1136
页数：6
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