Effect of γ-ray irradiation on structure formation and optical constants of thermally evaporated rhodamine B thin films

被引:29
作者
Zeyada, H. M. [1 ]
EL-Nahass, M. M. [2 ]
Samak, S. A. [1 ]
机构
[1] Univ Mansoura, Dept Phys, Fac Sci, Damietta Branch, New Damietta 34517, Egypt
[2] Ain Shams Univ, Dept Phys, Fac Educ, Cairo 11757, Egypt
关键词
Rhodamine B; Film thickness; Gamma-ray doses; Optical constants; ELECTRICAL-PROPERTIES; PHTHALOCYANINE; RADIATION; ABSORPTION; PARAMETERS; THICKNESS;
D O I
10.1016/j.jnoncrysol.2012.01.008
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Rhodamine B (RhB) is polycrystalline in powder form; it becomes nanocrystalline in thermally evaporated films. Gamma-rays induce nanocrystalline to amorphous transformation of RhB films. The optical constants are independent of film thickness. The type of electronic transition for as-deposited and gamma-ray irradiated RhB film is indirect allowed one. The onset and optical energy gap for as-deposited films are 2 and 3.45 eV, respectively. Exposure to different gamma-ray doses did not change the transmittance and reflectance behavior of RhB films. gamma-ray irradiation decreases onset and optical energy gap, refractive index and dispersion parameters and increase extinction coefficient, oscillator and electric dipole strengths. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:915 / 920
页数:6
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