Ion-beam-induced reconstruction of amorphous GaN

被引:23
作者
Kucheyev, SO [1 ]
Williams, JS
Zou, J
Bradby, JE
Jagadish, C
Li, G
机构
[1] Australian Natl Univ, Res Sch Phys Sci & Engn, Dept Elect Mat Engn, Canberra, ACT 0200, Australia
[2] Univ Sydney, Electron Microscope Unit, Sydney, NSW 2006, Australia
[3] Univ Sydney, Australian Key Ctr Microscopy & Microanal, Sydney, NSW 2006, Australia
[4] Ledex Corp, Kaohsiung, Taiwan
来源
PHYSICAL REVIEW B | 2001年 / 63卷 / 11期
关键词
D O I
10.1103/PhysRevB.63.113202
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Wurtzite GaN can be rendered amorphous by high-dose heavy-ion bombardment. We show here that relatively low-dose reirradiation of such amorphous GaN (a-GaN) with MeV light ions can significantly change some of the physical properties of a-GaN. In particular, light-ion reirradiation of a-GaN results in (i) an increase in material density, (ii) the suppression of complete decomposition during postimplantation annealing, (iii) a significant increase in the values of hardness and Young's modulus, and (iv) an apparent decrease in the absorption of visible light. Transmission electronmicroscopy shows that a-GaN remains completely amorphous after light-ion reirradiation. Therefore, we attribute the above effects of light-ion reirradiation to an ion-beam-induced atomic-level reconstruction of the amorphous phase. Results indicate that electronic energy loss of light ions is responsible for the changes in the mechanical properties and for the suppression of thermally induced decomposition of a-GaN. However, the changes in the density of a-GaN appear to be controlled by the nuclear energy loss of light ions.
引用
收藏
页数:3
相关论文
共 50 条
  • [21] ION-BEAM-INDUCED CRYSTALLIZATION OF NI50AL50 AMORPHOUS FILMS
    DELAFOND, J
    JAOUEN, C
    RIVIERE, JP
    FAYOUX, C
    MATERIALS SCIENCE AND ENGINEERING, 1985, 69 (01): : 117 - 121
  • [22] TWIN FORMATION AND AU SEGREGATION DURING ION-BEAM-INDUCED EPITAXY OF AMORPHOUS SI
    PRIOLO, F
    BATSTONE, JL
    POATE, JM
    LINNROS, J
    JACOBSON, DC
    THOMPSON, MO
    APPLIED PHYSICS LETTERS, 1988, 52 (13) : 1043 - 1045
  • [23] The complex mechanisms of ion-beam-induced deposition
    Chen, Ping
    Alkemade, Paul F. A.
    Salemink, Huub W. M.
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (06) : 5123 - 5126
  • [24] ION-BEAM-INDUCED EPITAXIAL CRYSTALLIZATION OF SAPPHIRE
    ZHOU, W
    SOOD, DK
    ELLIMAN, RG
    RIDGWAY, MC
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 1104 - 1108
  • [25] Ion-beam-induced stiffening of nanoporous silica
    Kucheyev, S. O.
    Hamza, A. V.
    Worsley, M. A.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (18)
  • [26] Ion-beam-induced bending of semiconductor nanowires
    Hanif, Imran
    Camara, Osmane
    Tunes, Matheus A.
    Harrison, Robert W.
    Greaves, Graeme
    Donnelly, Stephen E.
    Hinks, Jonathan A.
    NANOTECHNOLOGY, 2018, 29 (33)
  • [27] A THEORY OF ION-BEAM-INDUCED CHARGE COLLECTION
    BREESE, MBH
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (06) : 3789 - 3799
  • [28] Ion-beam-induced sharpening of ZnO nanotips
    Wu, P
    Saraf, G
    Lu, YC
    Hill, DH
    Bartynski, RA
    Arena, DA
    Ryu, MY
    Raley, JA
    Yeo, YK
    APPLIED PHYSICS LETTERS, 2004, 85 (07) : 1247 - 1249
  • [29] CHARACTERIZATION OF FOCUSED ION-BEAM-INDUCED DAMAGE
    VETTERLI, D
    DOBELI, M
    MUHLE, R
    NEBIKER, PW
    MUSIL, CR
    MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 339 - 342
  • [30] Ion-beam-induced damage formation in CdTe
    Rischau, C. W.
    Schnohr, C. S.
    Wendler, E.
    Wesch, W.
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (11)