Ion-beam-induced reconstruction of amorphous GaN

被引:23
|
作者
Kucheyev, SO [1 ]
Williams, JS
Zou, J
Bradby, JE
Jagadish, C
Li, G
机构
[1] Australian Natl Univ, Res Sch Phys Sci & Engn, Dept Elect Mat Engn, Canberra, ACT 0200, Australia
[2] Univ Sydney, Electron Microscope Unit, Sydney, NSW 2006, Australia
[3] Univ Sydney, Australian Key Ctr Microscopy & Microanal, Sydney, NSW 2006, Australia
[4] Ledex Corp, Kaohsiung, Taiwan
来源
PHYSICAL REVIEW B | 2001年 / 63卷 / 11期
关键词
D O I
10.1103/PhysRevB.63.113202
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Wurtzite GaN can be rendered amorphous by high-dose heavy-ion bombardment. We show here that relatively low-dose reirradiation of such amorphous GaN (a-GaN) with MeV light ions can significantly change some of the physical properties of a-GaN. In particular, light-ion reirradiation of a-GaN results in (i) an increase in material density, (ii) the suppression of complete decomposition during postimplantation annealing, (iii) a significant increase in the values of hardness and Young's modulus, and (iv) an apparent decrease in the absorption of visible light. Transmission electronmicroscopy shows that a-GaN remains completely amorphous after light-ion reirradiation. Therefore, we attribute the above effects of light-ion reirradiation to an ion-beam-induced atomic-level reconstruction of the amorphous phase. Results indicate that electronic energy loss of light ions is responsible for the changes in the mechanical properties and for the suppression of thermally induced decomposition of a-GaN. However, the changes in the density of a-GaN appear to be controlled by the nuclear energy loss of light ions.
引用
收藏
页数:3
相关论文
共 50 条
  • [1] Ion-beam-induced porosity of GaN
    Kucheyev, SO
    Williams, JS
    Jagadish, C
    Zou, J
    Craig, VSJ
    Li, G
    APPLIED PHYSICS LETTERS, 2000, 77 (10) : 1455 - 1457
  • [2] Ion-beam-induced chemical disorder in GaN
    Ishimaru, Manabu
    Zhang, Yanwen
    Weber, William J.
    JOURNAL OF APPLIED PHYSICS, 2009, 106 (05)
  • [3] Ion-beam-induced amorphous structures in silicon carbide
    Bae, IT
    Ishimaru, M
    Hirotsu, Y
    Matsumura, S
    Sickafus, KE
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 : 974 - 978
  • [4] Ion-beam-induced dissociation and bubble formation in GaN
    Kucheyev, SO
    Williams, JS
    Zou, J
    Jagadish, C
    Li, G
    APPLIED PHYSICS LETTERS, 2000, 77 (22) : 3577 - 3579
  • [5] Ion-beam-induced crystal grain nucleation in amorphous silicon carbide
    Höfgen, A
    Heera, V
    Mücklich, A
    Eichhorn, F
    Skorupa, W
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 161 : 917 - 921
  • [6] Characterization of ion-beam-induced amorphous structures by advanced electron microscopy
    Ishimaru, M
    Bae, IT
    Ohkubo, T
    Hirotsu, Y
    Sickafus, KE
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 190 : 882 - 886
  • [7] ION-BEAM-INDUCED EPITAXIAL REGROWTH OF AMORPHOUS LAYERS IN SILICON ON SAPPHIRE
    LINNROS, J
    SVENSSON, B
    HOLMEN, G
    PHYSICAL REVIEW B, 1984, 30 (07): : 3629 - 3638
  • [8] ION-BEAM-INDUCED EPITAXIAL CRYSTALLIZATION OF AMORPHOUS GAAS ON GAAS(100)
    KOBAYASHI, N
    HASEGAWA, M
    KOBAYASHI, H
    HAYASHI, N
    SHINOHARA, M
    OHTANI, F
    ASARI, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 59 : 449 - 453
  • [9] ION-BEAM-INDUCED MIXING OF THE BILAYERED STRUCTURE AMORPHOUS TINI/NI
    GABORIAUD, RJ
    DELAGE, J
    ABEL, F
    THIN SOLID FILMS, 1991, 200 (02) : 275 - 282
  • [10] ION-BEAM-INDUCED AMORPHIZATION
    OSSI, PM
    MATERIALS SCIENCE AND ENGINEERING, 1987, 90 : 55 - 68