Fabrication of black multicrystalline silicon surface by nanosecond laser ablation

被引：25

作者：

Zuev, D. A. ^{[1
]}

Novodvorsky, O. A. ^{[1
]}

Khaydukov, E. V. ^{[1
]}

Khramova, O. D. ^{[1
]}

Lotin, A. A. ^{[1
]}

Parshina, L. S. ^{[1
]}

Rocheva, V. V. ^{[1
]}

Panchenko, V. Y. ^{[1
]}

Dvorkin, V. V. ^{[2
]}

Poroykov, A. Y. ^{[2
]}

Untila, G. G. ^{[2
]}

Chebotareva, A. B. ^{[2
]}

Kost, T. N. ^{[2
]}

Timofeyev, M. A. ^{[2
]}

机构：

[1] Russian Acad Sci ILIT RAS, Inst Laser & Informat Technol, Shatura 140700, Moscow Region, Russia

[2] Moscow MV Lomonosov State Univ, Skobeltsyn Inst Nucl Phys MSU SINP, Moscow 119991, Russia

来源：

APPLIED PHYSICS B-LASERS AND OPTICS | 2011年 / 105卷 / 03期

基金：

俄罗斯基础研究基金会;

关键词：

FEMTOSECOND LASER; TEXTURIZATION; MICROSTRUCTURES; NANOSTRUCTURE; EVAPORATION;

D O I：

10.1007/s00340-011-4625-x

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The optimal regimes for uniform texturing of a multicrystalline silicon (mc-Si) surface by pulsed laser radiation have been determined. The morphology and reflectance spectra of the texturized mc-Si have been studied. The laser-texturized mc-Si samples with reflectance of 2-3% over a wide spectral region have been produced. The influence of subsequent chemical etching on the reflective properties of the texturized surface has been analyzed.

引用

页码：545 / 550

页数：6

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