Sub-micron InGaN ring structures for high-efficiency LEDs

被引:0
作者
Choi, HW [1 ]
Edwards, PR [1 ]
Liu, C [1 ]
Jeon, CW [1 ]
Martin, RW [1 ]
Watson, IM [1 ]
Dawson, MD [1 ]
Tripathy, S [1 ]
Chua, SJ [1 ]
机构
[1] Univ Strathclyde, Inst Photon, Glasgow G4 0NW, Lanark, Scotland
来源
E-MRS 2003 FALL MEETING, SYMPOSIA A AND C, PROCEEDINGS | 2004年 / 1卷 / 02期
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A novel technique based on the Fresnel diffraction effect for the fabrication of sub-micron ring structures in InGaN/GaN multi-quantum well structures has been demonstrated. The ring structures have an external diameter of 1.5 mum and a wall width of 500 nm. A1 cm(-1) Raman shift has been measured, signifying substantial strain relaxation from the fabricated structure. The 5 nm blue shift observed in the cathodoluminescence spectra can be attributed to band-filling and/or screening of the piezoelectric field. A light emitting diode based on this geometry has been demonstrated. (C) 2004 WILEY-VCH Verlag GmbH & Co. KGaA. Weinheim.
引用
收藏
页码:202 / 205
页数:4
相关论文
共 8 条
[1]   High extraction efficiency InGaN micro-ring light-emitting diodes [J].
Choi, HW ;
Dawson, MD ;
Edwards, PR ;
Martin, RW .
APPLIED PHYSICS LETTERS, 2003, 83 (22) :4483-4485
[2]   Fabrication and performance of parallel-addressed InGaN micro-LED arrays [J].
Choi, HW ;
Jeon, CW ;
Dawson, MD ;
Edwards, PR ;
Martin, RW .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2003, 15 (04) :510-512
[3]   Optical investigation of micrometer and nanometer-size individual GaN pillars fabricated by reactive ion etching [J].
Demangeot, F ;
Gleize, J ;
Frandon, J ;
Renucci, MA ;
Kuball, M ;
Peyrade, D ;
Manin-Ferlazzo, L ;
Chen, Y ;
Grandjean, N .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (10) :6520-6523
[4]   Raman determination of phonon deformation potentials in alpha-GaN [J].
Demangeot, F ;
Frandon, J ;
Renucci, MA ;
Briot, O ;
Gil, B ;
Aulombard, RL .
SOLID STATE COMMUNICATIONS, 1996, 100 (04) :207-210
[5]   InGaN/GaN quantum well interconnected microdisk light emitting diodes [J].
Jin, SX ;
Li, J ;
Lin, JY ;
Jiang, HX .
APPLIED PHYSICS LETTERS, 2000, 77 (20) :3236-3238
[6]  
Krames MR, 2002, PHYS STATUS SOLIDI A, V192, P237, DOI 10.1002/1521-396X(200208)192:2<237::AID-PSSA237>3.0.CO
[7]  
2-I
[8]  
WOLF S, 2000, SILICON PROCESSING V, V1, P560