Characterization of bis(tertiary-butylamino)silane-based low-pressure chemical vapor deposition silicate glass films

The bis(tertiary-butylamino)silane-based low-pressure chemical vapor deposition (LPCVD) undoped silicate glass and phospho-silicate glass (PSG) processes were investigated to study film composition, etch rate, and step coverage. Through the addition of phosphorous doping, LPCVD PSG processing offers an attractive low temperature option. Enhanced deposition rate for the PSG process enables the lowering of the deposition temperature to the 400-500 degreesC range, thereby minimizing the thermal cycle and offering compatibility with many back-end-of-line processes. Many properties of these films are similar to those of the tetraethoxysilane (TEOS)-based LPCVD oxide. Differences in the film properties compared with the TEOS-based LPCVD oxide films can be traced to the composition of these films and the reaction mechanism. (C) 2001 American Vacuum Society.