[2] Friedrich Alexander Univ Erlangen Nurnberg FAU, Inst Mfg Metrol, Nagelsbachstr 25, D-91052 Erlangen, Germany
来源:
SURFACE TOPOGRAPHY-METROLOGY AND PROPERTIES
|
2016年
/
4卷
/
03期
关键词:
nanopositioning and nanomeasuring;
multiaxis interferometer;
optical sensors;
D O I:
10.1088/2051-672X/4/3/034004
中图分类号:
TH [机械、仪表工业];
学科分类号:
0802 ;
摘要:
High-precision metrology has emerged as an enabling technology for modern key technologies. Therefore, at the Technische Universitat Ilmenau, a new nanopositioning and nanomeasuring machine NPMM-200 with a measuring range of 200 mm x 200 mm x 25 mm, and a resolution of 0.02 nm was developed. The machine represents the great improvement of the extended three-dimensional Abbe comparator principle to achieve nanometre accuracy. All six degrees of freedom of the mirror plate with the measuring object are measured by fibre-coupled laser interferometers, the signals of which are then used together with the probe system signals for a high-precision position and orientation control and surface and coordinate measurements. This paper presents the metrological concept, the realized design as well as the metrological parameters.