Nanopositioning and nanomeasuring machine NPMM-200-a new powerful tool for large-range micro- and nanotechnology

被引:52
作者
Jaeger, G. [1 ]
Manske, E. [1 ]
Hausotte, T. [2 ]
Mueller, A. [1 ]
Balzer, F. [1 ]
机构
[1] Tech Univ Ilmenau, Inst Proc Measurement & Sensor Technol, D-98684 Ilmenau, Germany
[2] Friedrich Alexander Univ Erlangen Nurnberg FAU, Inst Mfg Metrol, Nagelsbachstr 25, D-91052 Erlangen, Germany
来源
SURFACE TOPOGRAPHY-METROLOGY AND PROPERTIES | 2016年 / 4卷 / 03期
关键词
nanopositioning and nanomeasuring; multiaxis interferometer; optical sensors;
D O I
10.1088/2051-672X/4/3/034004
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
High-precision metrology has emerged as an enabling technology for modern key technologies. Therefore, at the Technische Universitat Ilmenau, a new nanopositioning and nanomeasuring machine NPMM-200 with a measuring range of 200 mm x 200 mm x 25 mm, and a resolution of 0.02 nm was developed. The machine represents the great improvement of the extended three-dimensional Abbe comparator principle to achieve nanometre accuracy. All six degrees of freedom of the mirror plate with the measuring object are measured by fibre-coupled laser interferometers, the signals of which are then used together with the probe system signals for a high-precision position and orientation control and surface and coordinate measurements. This paper presents the metrological concept, the realized design as well as the metrological parameters.
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页数:8
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