Use of self-assembled monolayers for selective metal removal and ultrathin gate dielectrics in MoS2 field-effect transistors

被引:3
作者
Du, Wanjing [1 ]
Kawanago, Takamasa [1 ]
Oda, Shunri [1 ]
机构
[1] Tokyo Inst Technol, Quantum Nanoelect Res Ctr, Inst Innovat Res, Meguro Ku, Tokyo 1520033, Japan
关键词
D O I
10.7567/JJAP.56.04CP10
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate a simple and rapid method for the fabrication of multilayer molybdenum disulfide (MoS2) field-effect transistors (FETs) by exploiting various functions of an octadecylphosphonic acid (ODPA)-based self-assembled monolayer (SAM). The SAM is used both for selective metal removal in patterning to simplify the fabrication process and as an ultrathin gate dielectrics in the device. The low voltage operation of the MoS2 FETs was observed with a low gate leakage current and small hysteresis. In addition, selective metal removal can effectively narrow the spacing between the gate and contact electrodes, resulting in improved device characteristics. This approach also makes it possible to transfer thinner and smaller MoS2 flakes. This study suggests intriguing applications of the SAM for the fabrication of functional electronic devices. (C) 2017 The Japan Society of Applied Physics
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页数:5
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