Measurement of Hydrogen Radical Density and Its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases

被引：44

作者：

Inui, Hirotoshi ^{[1
]}

Takeda, Keigo ^{[1
]}

Kondo, Hiroki ^{[1
]}

Ishikawa, Kenji ^{[1
]}

Sekine, Makoto ^{[1
]}

Kano, Hiroyuki ^{[2
]}

Yoshida, Naofumi ^{[3
]}

Hori, Masaru ^{[1
]}

机构：

[1] Nagoya Univ, Dept Elect Engn & Comp Sci, Nagoya, Aichi 4648603, Japan

[2] NU Ecoengn Co Ltd, Aichi 4700201, Japan

[3] Fuji Machine Mfg Co Ltd, Aichi 4728686, Japan

来源：

APPLIED PHYSICS EXPRESS | 2010年 / 3卷 / 12期

关键词：

DIELECTRIC BARRIER DISCHARGE; GLOW-DISCHARGE; THIN-FILMS; OXIDATION; PHYSICS;

D O I：

10.1143/APEX.3.126101

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A 60 Hz alternating current excited atmospheric-pressure plasma with an ultrahigh electron density of over 10(16) cm(-3) employing H-2/Ar [p(H-2)/p(H-2 + Ar) 1-3%] gases was used to reduce copper oxides on copper. The remote plasma reduced CuO and Cu2O at room temperature. The ground-state hydrogen (H) radical density in the atmospheric-pressure plasma was measured by vacuum ultraviolet absorption spectroscopy using a micro hollow cathode lamp. The ratio of reduction of amount of CuO flux to the H radical flux was determined from the measured H radical density and gas temperature. (C) 2010 The Japan Society of Applied Physics

引用

页数：3

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