X-ray photoelectron spectroscopy study on n-type GaAs

A surface characterization has been performed on n-type GaAs (Si: GaAs) samples by using X-ray photoelectron spectroscopy (XPS) technique in order to get information on the degree of surface contamination during the device processing steps. The GaAs samples were etched by "in situ" ion sputtering (Ar plasma) before and after carrying out the measurements. According to XPS measurements the native oxide layer on as-received surface contains As2O3, AS(2)O(5) and Ga2O3. Large amounts of C and O are also present at surface before plasma cleaning of surface: C-C bonds, chemisorbed oxygen atoms. The XPS spectra recorded on the surface sample sputtered with 5 keV Ar+ ions were analyzed using SDP subroutines program facilities. After the first sputtering step it was observed different shifts of the principal peaks of GaAs bonding and compounds together with a modification of the relative peak intensities. The C1s and O1s peak size decreased but remained still significant. The following sputtering steps lead to a drastically decrease of C and 0 peaks down to the noise level.