Numerical simulation of chemical processes in helium plasmas in atmosphere environment

被引：0

作者：

Ouyang, JM ^{[1
]}

Guo, W

Wang, L

Shao, FQ

机构：

[1] Natl Univ Def Technol, Changsha 410073, Peoples R China

[2] Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China

来源：

CHINESE PHYSICS | 2005年 / 14卷 / 01期

关键词：

helium plasma; chemical processes; lifetime;

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

引用

页码：154 / 158

页数：5