Temperature dependence of the electrical characteristics of low-temperature processed zinc oxide thin film transistors

被引:7
|
作者
Estrada, M. [1 ]
Gutierrez-Heredia, G. [4 ]
Cerdeira, A. [1 ]
Alvarado, J. [2 ]
Garduno, I. [2 ]
Tinoco, J. [3 ]
Mejia, I. [4 ]
Quevedo-Lopez, M. [4 ]
机构
[1] CINVESTAV, IPN, SEES, Dept Ingn Elect, Mexico City 07360, DF, Mexico
[2] Benemerita Univ Autonoma Puebla, CIDS, Inst Ciencias, Puebla 72570, Mexico
[3] Univ Veracruzana, Micro & Nanotechnol Res Ctr MICRONA, Boca Del Rio 94294, Veracruz, Mexico
[4] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75080 USA
基金
美国国家科学基金会;
关键词
Zinc oxide; Thin film transistors; Temperature; Low-temperature processing; Pulse laser deposition;
D O I
10.1016/j.tsf.2014.10.092
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The impact on the electrical behavior of thin film transistors, TFTs, based on zinc oxide, ZnO-based TFTs, with temperature is analyzed. ZnO is deposited using pulsed laser deposition techniques and the temperature used during the entire fabrication process is kept below 100 degrees C. Up to 330 K, the transfer curves practically remain constant or slightly shifted toward more positive voltages. For temperatures up to 330 K, they show the combined effect of the threshold voltage shifting toward more negative voltages and the increase of series resistance. The drain current shows an Arrhenius-type dependence with temperature in subthreshold regime with activation energy of around 0.53 eV. In above threshold regime, for temperatures above 330 K, the activation energy is around 0.15 eV. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:18 / 21
页数:4
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