Dual source atmospheric pressure chemical vapour deposition of TiP films on glass using TiCl4 and PH2But

被引：17
作者：
Blackman, C
Carmalt, CJ
O'Neill, SA
Parkin, IP
Apostilco, L
Molloy, KC
机构：
[1] UCL, Dept Chem, London WC1H OAJ, England
[2] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England
来源：
JOURNAL OF MATERIALS CHEMISTRY | 2001年 / 11卷 / 10期
关键词：
D O I：
10.1039/b105140g
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A facile new method for the preparation of large area titanium phosphide films on glass is described from the atmospheric pressure chemical vapour deposition of titanium tetrachloride and tert-butylphosphine.
引用
收藏
页码：2408 / 2409
页数：2
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