Dual source atmospheric pressure chemical vapour deposition of TiP films on glass using TiCl4 and PH2But

被引：17

作者：

Blackman, C

Carmalt, CJ

O'Neill, SA

Parkin, IP

Apostilco, L

Molloy, KC

机构：

[1] UCL, Dept Chem, London WC1H OAJ, England

[2] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2001年 / 11卷 / 10期

关键词：

D O I：

10.1039/b105140g

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A facile new method for the preparation of large area titanium phosphide films on glass is described from the atmospheric pressure chemical vapour deposition of titanium tetrachloride and tert-butylphosphine.

引用

页码：2408 / 2409

页数：2

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