Commercial polyurethane film (PU) was modified with Ar plasma ionized in dielectric barrier discharge (DBD) plate-type reactor under atmospheric pressure. We measured the change of the contact angle and the surface free energy with respect to the plasma treatment conditions such as treatment time, RF-power, and Ar gas flow rate. We also optimized the plasma treatment conditions to maximize the surface peroxide concentration. At the plasma treatment time of 70 sec, the power of 120 W and the Ar gas flow rate of 5 liter per minute (LPM), the best wettability and the highest surface free energy were obtained. The 1,1-diphenyl-2-picrylhydrazyl (DPPH) method confirmed that the surface peroxide concentration was about 2.1 nmol/cm(2) at 80 W, 30 sec, 6 LPM.
机构:
Donghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R ChinaDonghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R China
Gao, Zhiqiang
Sun, Jie
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机构:Donghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R China
Sun, Jie
Peng, Shujing
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Donghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R ChinaDonghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R China
Peng, Shujing
Yao, Lan
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Donghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R ChinaDonghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R China
Yao, Lan
Qiu, Yiping
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Donghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R ChinaDonghua Univ, Dept Text Mat Sci & Prod Design, Coll Text, Shanghai 201620, Peoples R China
机构:
Univ Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, SpainUniv Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, Spain
Encinas, N.
Dillingham, R. G.
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Brighton Technol Grp Inc, Cincinnati, OH USAUniv Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, Spain
Dillingham, R. G.
Oakley, B. R.
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Brighton Technol Grp Inc, Cincinnati, OH USAUniv Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, Spain
Oakley, B. R.
Abenojar, J.
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Univ Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, SpainUniv Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, Spain
Abenojar, J.
Martinez, M. A.
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Univ Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, SpainUniv Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, Spain
Martinez, M. A.
Pantoja, M.
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Univ Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, SpainUniv Carlos III Madrid, Mat Sci & Engn Dept, IAAB, Mat Performance Grp, Madrid 28911, Spain
机构:
Tokyo Univ Sci, Dept Mat Sci & Technol, Chiba 2788510, Japan
Tokyo Univ Sci, Polyscale Technol Res Ctr, Chiba 2788510, JapanTokyo Univ Sci, Dept Mat Sci & Technol, Chiba 2788510, Japan
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Univ Zagreb, Fac Text Technol, Prilaz Baruna Filipovica 28a, Zagreb 10000, CroatiaUniv Zagreb, Fac Text Technol, Prilaz Baruna Filipovica 28a, Zagreb 10000, Croatia
Peran, Jelena
Razic, Sanja Ercegovic
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Univ Zagreb, Fac Text Technol, Prilaz Baruna Filipovica 28a, Zagreb 10000, CroatiaUniv Zagreb, Fac Text Technol, Prilaz Baruna Filipovica 28a, Zagreb 10000, Croatia