Low energy electron interaction with haloethanes

被引：0

作者：

Kopyra, J ^{[1
]}

Barszczewska, W ^{[1
]}

Wnorowska, J ^{[1
]}

Forys, M ^{[1
]}

Szamrej, I ^{[1
]}

机构：

[1] Univ Podlasie, Dept Chem, PL-08110 Siedlce, Poland

来源：

ACTA PHYSICA SLOVACA | 2005年 / 55卷 / 05期

关键词：

ATTACHMENT; HALOMETHANES; CHF3;

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The dissociative electron attachment to chloro and fluoro derivatives of ethane have been measured using swarm technique. The rate coefficients have been estimated for first time for many of them and the values of the rate coefficients have been correlated to the DEA energies.

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收藏

页码：447 / 451

页数：5

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