Influence of the structure of the surface layer of silica glass on the radiation losses in the UV spectral range

被引:1
作者
Zemlyanskii, V. S. [1 ]
Stepanchuk, A. A. [2 ]
Sychev, M. M. [2 ]
Khramtsovskii, I. A. [1 ]
机构
[1] St Petersburg State Univ, St Petersburg 197101, Russia
[2] Tech Univ, St Petersburg State Technol Inst, St Petersburg 190013, Russia
关键词
Optical Element; Silica Glass; Glass Physic; Radiation Loss; Diamond Powder;
D O I
10.1134/S1087659608030036
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The specific features of the formation of positional and combined disordering of the silicon-oxygen network structure during the synthesis of silica glasses are analyzed. It is demonstrated that this structural disordering affects the optical inhomogeneity in the refractive index in a block of the vapor-deposited silica glass. The experimental data obtained by ellipsometry, Auger electron spectroscopy, and spectrophotometry are used to reveal correlations between the physicochemical properties of the surface layer of the silica glass and the radiation losses in the UV spectral range.
引用
收藏
页码:248 / 254
页数:7
相关论文
共 16 条
[1]  
Amosov A., 1984, FIZIKA KHIMIYA STEKL, V10, P305
[2]  
AMOSOV AV, 1983, FIZ KHIM STEKLA, V9, P569
[3]  
Eliseeva I.I., 2004, OBSHCHAYA TEORIYA ST
[4]  
KHALILOV VK, 1983, FIZ KHIM STEKLA, V9, P195
[5]  
KHRAMTSOVSKII IA, 1987, ZH PRIKL SPEKTROSK, V46, P272
[6]  
KHRAMTSOVSKII IA, 1999, CAND SCI DISS PET PE
[7]  
KHRAMTSOVSKII IA, 1983, OPT-MEKH PROMST, P38
[8]  
KHRAMTSOVSKY IA, 1988, OPT SPEKTROSK+, V65, P141
[9]  
Leko V.K., 1979, FIZ KHIM STEKLA, V5, P258
[10]  
MANSUROV GM, 1982, OPT SPEKTROSK+, V52, P852