Energy device for monitoring 4-10 MeV industrial electron accelerators

被引:12
作者
Fuochi, PG
Lavalle, M
Martelli, A
Corda, U
Kovács, A
Hargittai, P
Mehta, K
机构
[1] CNR Inst, ISOF, I-40129 Bologna, Italy
[2] Hungarian Acad Sci, CRC, Inst Isotopes, H-1525 Budapest, Hungary
关键词
beam energy; charge deposition; electron beam; electron energy; electron processing; process control;
D O I
10.1016/j.nima.2005.02.038
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The electron beam energy is one of the critical parameters for electron processing, since it can affect the dose distribution in the product. We have developed a robust device for monitoring small variations in the electron beam energy that is easy-to-use during an irradiation run. It involves measurement of currents intercepted by two aluminium plates located in the beam. The ratio of these two currents is quite sensitive to the beam energy; sensitivity is optimised by selecting the appropriate thickness of the front plate depending on the beam energy. We had reported on this energy device earlier for the energy range of 7-12 MeV. In the present paper, we have investigated the feasibility of using this energy device at lower energies, from 4 to 6 MeV. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:385 / 390
页数:6
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