Laser-induced bulk damage in various types of vitreous silica at 1064, 532, 355, and 266 nm: evidence of different damage mechanisms between 266-nm and longer wavelengths

Laser-induced-damage thresholds (LIDT's) with various types of vitreous silica at 1064, 532, 355, and 266 nm are investigated. At 1064 nm no difference in the LIDT was observed in any sample. At 1064-355 nm the wavelength dependence of the LIDT of synthetic fused silica (SFS) can be described well by the relation I-th = 1.45 lambda(0.43), where I-th the LIDT in J/cm(2) and lambda is the wavelength in nanometers. At 266 nm, however, LIDT's were smaller than half of the calculated value from the relation above. This difference can be explained by the damage mechanism; at 266 nm two-photon absorption-induced defects lower the LIDT as in the case of KrF-excimer-laser-induced defects, whereas at longer wavelengths the two-photon process does not occur. LIDT's of fused quartz (FQ) at 532 and 355 nm and that of SFS containing similar to 1000 ppm of Cl and no OH at 355 nm were a little lower than those of the other SFS's. This lower LIDT may be related to the absorption of metallic impurities in FQ and dissolved Cl-2 molecules in SFS. At 266 nm, on the other hand, LID's of FQ's were higher than those of most SFS's. (C) 1999 Optical Society of America.