Properties of large-area nanomagnet arrays with 100 nm period made by interferometric lithography

被引：100
作者：
Savas, TA [1 ]
Farhoud, M
Smith, HI
Hwang, M
Ross, CA
机构：
[1] MIT, Dept Phys, Cambridge, MA 02139 USA
[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
来源：
JOURNAL OF APPLIED PHYSICS | 1999年 / 85卷 / 08期
关键词：
D O I：
10.1063/1.370029
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A method is presented for the fabrication of large-area arrays of magnetic particles with 100 nm period, using achromatic interferometric lithography combined with etching, electrodeposition, or an evaporation and liftoff processes. These "nanomagnet'' arrays have applications in patterned magnetic media, in magnetic memories, and for studies of particle interactions. (C) 1999 American Institute of Physics. [S0021-8979(99)69208-8].
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收藏
页码：6160 / 6162
页数：3
相关论文
共 11 条
[1]   STUDY OF NANOSCALE MAGNETIC-STRUCTURES FABRICATED USING ELECTRON-BEAM LITHOGRAPHY AND QUANTUM MAGNETIC DISK [J].
CHOU, SY ;
WEI, M ;
KRAUSS, PR ;
FISCHER, PB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06) :3695-3698
[2]   Fabrication of large area nanostructured magnets by interferometric lithography [J].
Farhoud, M ;
Hwang, M ;
Smith, HI ;
Schattenburg, ML ;
Bae, JM ;
Youcef-Toumi, K ;
Ross, CA .
IEEE TRANSACTIONS ON MAGNETICS, 1998, 34 (04) :1087-1089
[3]   Magnetic force microscopy of single-domain cobalt dots patterned using interference lithography [J].
Fernandez, A ;
Bedrossian, PJ ;
Baker, SL ;
Vernon, SP ;
Kania, DR .
IEEE TRANSACTIONS ON MAGNETICS, 1996, 32 (05) :4472-4474
[4]   Reversal mechanism of submicron patterned CoNi/Pt multilayers [J].
Haast, MAM ;
Schuurhuis, JR ;
Abelmann, L ;
Lodder, JC ;
Popma, TJ .
IEEE TRANSACTIONS ON MAGNETICS, 1998, 34 (04) :1006-1008
[5]  
KUNZ RR, 1994, P SOC PHOTO-OPT INS, V2195, P447, DOI 10.1117/12.175358
[6]   Large-area achromatic interferometric lithography for 100 nm period gratings and grids [J].
Savas, TA ;
Schattenburg, ML ;
Carter, JM ;
Smith, HI .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4167-4170
[7]   Optically matched trilevel resist process for nanostructure fabrication [J].
Schattenburg, ML ;
Aucoin, RJ ;
Fleming, RC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :3007-3011
[8]   Fabrication of sub-0.5 mu m diameter cobalt dots on silicon substrates and photoresist pedestals on 50cmx50cm glass substrates using laser interference lithography [J].
Spallas, JP ;
Boyd, RD ;
Britten, JA ;
Fernandez, A ;
Hawryluk, AM ;
Perry, MD ;
Kania, DR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03) :2005-2007
[9]   Preparation of Co-Fe-P amorphous fine needles with anodization technique and measurement of demagnetizing factor [J].
Tayaoka, A ;
Tayaoka, E ;
Yamasaki, J .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (08) :6016-6018
[10]   Magnetization reversal in nanostructured Co/Pt multilayer dots and films [J].
Thielen, M ;
Kirsch, S ;
Weinforth, H ;
Carl, A ;
Wassermann, EF .
IEEE TRANSACTIONS ON MAGNETICS, 1998, 34 (04) :1009-1011
12