Index of refraction of germanium

被引：12

作者：

Burnett, John H. ^{[1
]}

Benck, Eric C. ^{[1
]}

Kaplan, Simon G. ^{[1
]}

Stover, Erik ^{[2
]}

Phenis, Adam ^{[3
]}

机构：

[1] NIST, Phys Measurement Lab, 100 Bur Dr, Gaithersburg, MD 20899 USA

[2] M3 Measurement Solut Inc, 938 S Andreasen Dr,Suite 1, Escondido, CA 92029 USA

[3] AMP Opt, 13308 Midland Rd,1304, Poway, CA 92074 USA

来源：

APPLIED OPTICS | 2020年 / 59卷 / 13期

关键词：

WAVELENGTH; SILICON;

D O I：

10.1364/AO.382408

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Measurements of the index of refraction of a sample of high-quality, single-crystal germanium using the minimum deviation refractometry method are presented for temperatures near 22 degrees C and for wavelengths in the range 2 to 14 mu m. The standard uncertainty for the measurements ranges from 1.5 x 10(-5) to 4.2 x 10(-5), generally increasing with wavelength. A Sellmeier formula fitting the data for this range is provided. Details of the custom system and procedures are presented, along with a detailed analysis of the uncertainty. These results are compared with previous measurements.

引用

页码：3985 / 3991

页数：7

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