Analysis of AlGaN/GaN HEMT using discrete field plate technique for high power and high frequency applications

被引:58
作者
Fletcher, A. S. Augustine [1 ]
Nirmal, D. [1 ]
Ajayan, J. [2 ]
Arivazhagan, L. [1 ]
机构
[1] Karunya Inst Technol & Sci, Dept ECE, Coimbatore, Tamil Nadu, India
[2] SNS Coll Technol, Coimbatore, Tamil Nadu, India
关键词
GaN HEMT; Electric field; Breakdown voltage; Field plate; Cut off frequency; ELECTRON-MOBILITY TRANSISTORS; BREAKDOWN VOLTAGE; PASSIVATION; RF; SI;
D O I
10.1016/j.aeue.2018.12.006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the RF and DC characteristicS of AlGaN/GaN High electron mobility transistor is analysed using discrete field plate technique. Surprisingly, it reduces the device parasitic capacitance exhibiting very low C-Gs and C-GD of 5.8 x 10(-13) F/mm and 4.2 x 10(-13) F/mm respectively to improve the cut off frequency (f(T)) from 17.5 GHz to 20 GHz. The discrete field plate suppresses the maximum electric field between gate and drain region to achieve the high breakdown voltage of 330 V. The maximum transconductance (g(m)) achieved is 275 mS/mm, ensuring the better DC operation of the device. The simulated results clearly show that, the discrete field plate HEMTs are superior in performance over conventional GaN FP-HEMTs for future high frequency and high power applications. (C) 2018 Elsevier GmbH. All rights reserved.
引用
收藏
页码:325 / 330
页数:6
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