Kinetics of plasma-assisted boriding

被引：21

作者：

Filep, E

Farkas, S ^{[1
]}

机构：

[1] Flextron Photon, Hillsboro, OR USA

[2] Univ Sapientia, Targu Mures, Romania

来源：

SURFACE & COATINGS TECHNOLOGY | 2005年 / 199卷 / 01期

关键词：

plasma deposition; boron; kinetics of deposition;

D O I：

10.1016/j.surfcoat.2005.03.031

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A study of boron condensation kinetics on steel in DC plasma discharge, using a mixture of BCl3-H-2 is presented. The aim of the study is to investigate the kinetics of this reaction in a temperature range of 750-800 degrees C and at a constant pressure of 520-550 Pa. Assuming a laminar flow of the gas mixture and regarding our experimental equipment as a tubular, non-isothermal reactor, we described the distribution of the concentration of boron trichloride and hydrogen chloride along the central cathode. Pictures of the cathode surface show a gradual formation of boron in the direction of flow of the gas mixture. At the same time, a maximum of the hydrogen chloride concentration passes along the surface of the cathode. The rate of the process is directly proportional to the initial concentration of boron trichloride. (c) 2005 Elsevier B.V All rights reserved.

引用

页码：1 / 6

页数：6

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