Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography

被引：8

作者：

Fresco, ZM ^{[1
]}

Bensel, N ^{[1
]}

Suez, I ^{[1
]}

Backer, SA ^{[1
]}

Fréchet, JMJ ^{[1
]}

Conley, W ^{[1
]}

机构：

[1] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2003年 / 16卷 / 01期

关键词：

dissolution inhibitor; 157; nm; QCM; hexafluoroalcohol;

D O I：

10.2494/photopolymer.16.27

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

We present the synthesis and screening of a series of new fluorinated materials designed to act as chemically amplified dissolution inhibitors for 157 nm lithography. Dissolution rates measured using a quartz crystal microbalance apparatus on a variety of matrix polymers as well as initial results demonstrating the imageability of this multi-component system are described.

引用

页码：27 / 35

页数：9

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