Ellipsometry for determining the refractive index profiles of thin films

被引：3
|
作者：
Tolmachev, VA
机构：
来源：
POLARIMETRY AND ELLIPSOMETRY | 1997年 / 3094卷
关键词：
colloid; error range; generated profiles; inhomogeneous layer; minimization; multiangle; reflectance;
D O I：
10.1117/12.271827
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The results of using the inhomogeneous models as well as technique for their error determining are demonstrated. An inhomogeneous profile error was presented as set of ''error profiles''. The homogeneous, linear and exponential models of profiles of N and K were used for searching. Initial colloid SiO2 film, after its heating and exposition in air as well as after reactivating was studied. The layers with decreasing PbO component were found on surface of PbO-SiO2 glass. Graded N and K profiles of In2O3 - SnO2 film, used as transparent conducting electrode, were determined by multiangle ellipsometry st wavelength of 632.8 nm.
引用
收藏
页码：281 / 287
页数：7
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