Suppression of nonradiative recombination process in directly Si-doped InAs/GaAs quantum dots

被引:27
作者
Kita, Takashi [1 ]
Hasagawa, Ryuichi [1 ]
Inoue, Tomoya [1 ]
机构
[1] Kobe Univ, Dept Elect & Elect Engn, Fac Engn, Nada Ku, Kobe, Hyogo 6578501, Japan
关键词
D O I
10.1063/1.3660794
中图分类号
O59 [应用物理学];
学科分类号
摘要
We carried out direct impurity doping in InAs/GaAs quantum dots (QDs) by selecting the self-assembled growth steps. The photoluminescence (PL) intensity of the Si-doped QDs is enhanced, and thermal quenching of the PL intensity is found to be considerably suppressed, whereas such improvement was not confirmed in Be-doped QDs. The excitation energy dependences of the PL intensity and the time-resolved PL indicate a reduction in the nonradiative recombination probability during the thermalization of carriers generated by high-energy photons. From these results, excess electrons in doped QDs neutralize and, therefore, inactivate the nonradiative recombination centers created by electron traps. (C) 2011 American Institute of Physics. [doi:10.1063/1.3660794]
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页数:4
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