Tunability Properties and Compact Modeling of HfO2-Based Complementary Resistive Switches Using a Three-Terminal Subcircuit

被引:3
作者
Saludes-Tapia, M. [1 ]
Poblador, S. [2 ]
Gonzalez, M. B. [2 ]
Campabadal, F. [2 ]
Sune, J. [1 ]
Miranda, E. [1 ]
机构
[1] Univ Autonoma Barcelona, Dept Engn Elect, Bellaterra 08193, Spain
[2] CSIC, Inst Microelect Barcelona IMB CNM, Bellaterra 08193, Spain
关键词
Complementary resistive switching (CRS); HfO2; memristor; OPERATIONS;
D O I
10.1109/TED.2021.3117488
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Complementary resistive switching (CRS) arises when two bipolar-mode memristive devices are antiserially connected, forming a single functional structure. The combined effect of both memristors leads to the appearance of high (HRS) and low (LRS) resistance windows in the current-voltage (I-V) characteristic that finds application in fields such as neuromorphic computing and logic circuits. In this work, the electric behavior of HfO2-based CRS devices intentionally fabricated with a common central electrode is investigated both from experimental and modeling viewpoints. Experiments reveal that the maximum voltage applied to the structure allows tuning the amplitude of the resistance window following a self-balance dynamics. The origin of the abrupt (digital) and gradual (analog) transitions between the HRS and LRS states is elucidated through the inclusion of the snapback and snap-forward effects in the switching dynamics. The I-V characteristics of the CRS devices are compact modeled with two opposite-biased memdiodes and simulated in LTSpice using an equivalent three-terminal subcircuit. It is shown that the proposed model is able to reproduce with a high degree of accuracy not only the observed CRS behavior for HfO2 but also the main features exhibited by devices with a wide variety of oxide/electrode materials.
引用
收藏
页码:5981 / 5988
页数:8
相关论文
共 33 条
[1]   Resistive switching in HfO2 based valence change memories, a comprehensive 3D kinetic Monte Carlo approach [J].
Aldana, S. ;
Garcia-Fernandez, P. ;
Romero-Zaliz, R. ;
Gonzalez, M. B. ;
Jimenez-Molinos, F. ;
Gomez-Campos, F. ;
Campabadal, F. ;
Roldan, J. B. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2020, 53 (22)
[2]   Analytical Modeling of Oxide-Based Bipolar Resistive Memories and Complementary Resistive Switches [J].
Ambrogio, Stefano ;
Balatti, Simone ;
Gilmer, David C. ;
Ielmini, Daniele .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (07) :2378-2386
[3]   'Memristive' switches enable 'stateful' logic operations via material implication [J].
Borghetti, Julien ;
Snider, Gregory S. ;
Kuekes, Philip J. ;
Yang, J. Joshua ;
Stewart, Duncan R. ;
Williams, R. Stanley .
NATURE, 2010, 464 (7290) :873-876
[4]   Realization of Minimum and Maximum Gate Function in Ta2O5-based Memristive Devices [J].
Breuer, Thomas ;
Nielen, Lutz ;
Roesgen, Bernd ;
Waser, Rainer ;
Rana, Vikas ;
Linn, Eike .
SCIENTIFIC REPORTS, 2016, 6
[5]   Physical and chemical mechanisms in oxide-based resistance random access memory [J].
Chang, Kuan-Chang ;
Chang, Ting-Chang ;
Tsai, Tsung-Ming ;
Zhang, Rui ;
Hung, Ya-Chi ;
Syu, Yong-En ;
Chang, Yao-Feng ;
Chen, Min-Chen ;
Chu, Tian-Jian ;
Chen, Hsin-Lu ;
Pan, Chih-Hung ;
Shih, Chih-Cheng ;
Zheng, Jin-Cheng ;
Sze, Simon M. .
NANOSCALE RESEARCH LETTERS, 2015, 10
[6]   Filament Growth and Resistive Switching in Hafnium Oxide Memristive Devices [J].
Dirkmann, Sven ;
Kaiser, Jan ;
Wenger, Christian ;
Mussenbrock, Thomas .
ACS APPLIED MATERIALS & INTERFACES, 2018, 10 (17) :14857-14868
[7]   The Role of Ti Capping Layer in HfOx-Based RRAM Devices [J].
Fang, Zheng ;
Wang, Xin Peng ;
Sohn, Joon ;
Weng, Bao Bin ;
Zhang, Zhi Ping ;
Chen, Zhi Xian ;
Tang, Yan Zhe ;
Lo, Guo-Qiang ;
Provine, J. ;
Wong, Simon S. ;
Wong, H. -S. Philip ;
Kwong, Dim-Lee .
IEEE ELECTRON DEVICE LETTERS, 2014, 35 (09) :912-914
[8]   Improved Switching Stability and the Effect of an Internal Series Resistor in HfO2/TiOX Bilayer ReRAM Cells [J].
Hardtdegen, Alexander ;
La Torre, Camilla ;
Cueppers, Felix ;
Menzel, Stephan ;
Waser, Rainer ;
Hoffmann-Eifert, Susanne .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (08) :3229-3236
[9]   Voltage divider effect for the improvement of variability and endurance of TaOx memristor [J].
Kim, Kyung Min ;
Yang, J. Joshua ;
Strachan, John Paul ;
Grafals, Emmanuelle Merced ;
Ge, Ning ;
Melendez, Noraica Davila ;
Li, Zhiyong ;
Williams, R. Stanley .
SCIENTIFIC REPORTS, 2016, 6
[10]   Reversible switching mode change in Ta2O5-based resistive switching memory (ReRAM) [J].
Kim, Taeyoon ;
Son, Heerak ;
Kim, Inho ;
Kim, Jaewook ;
Lee, Suyoun ;
Park, Jong Keuk ;
Kwak, Joon Young ;
Park, Jongkil ;
Jeong, YeonJoo .
SCIENTIFIC REPORTS, 2020, 10 (01)