Stoichiometric amorphous MoO3 films:: A route to high performance electrochromic devices -: art. no. 026104

被引：39
|
作者：
Sian, TS [1 ]
Reddy, GB [1 ]
机构：
[1] Indian Inst Technol, Dept Phys, Thin Film Lab, New Delhi 110016, India
来源：
JOURNAL OF APPLIED PHYSICS | 2005年 / 98卷 / 02期
关键词：
D O I：
10.1063/1.1949271
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The effect of stoichiometry on the coloration efficiency (eta) and cycling life of MoO3 films has been investigated and underlying reasons discussed in the paper. Optical studies reveal that as-deposited and 150 degrees C annealed films are nonstoichiometric while films deposited by activated reactive evaporation are stoichiometric. Nonstoichiometry in unintercalated MoO3 is associated with lower valence states of Mo is responsible for absorption in the 400-1000-nm spectral region. It is found that this nonstoichiometry affects eta and the cycling life of the films adversely. (c) 2005 American Institute of Physics.
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页数：3
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