X-ray photoelectron spectroscopy studies of the reduction of MoO3 thin films by NH3

被引:21
作者
Leung, YL
Wong, PC
Mitchell, KAR
Smith, KJ
机构
[1] Univ British Columbia, Dept Chem, Vancouver, BC V6T 1Z1, Canada
[2] Univ British Columbia, Dept Chem Engn, Vancouver, BC V6T 1Z4, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
X-ray photoelectron spectroscopy; reduction; MoO3; NH3;
D O I
10.1016/S0169-4332(98)00341-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
X-ray photoelectron spectroscopy (XPS) has been used to gain insight into surface reaction pathways associated with the nitridation by NH3 of MoO3 thin films grown on metallic substrates. The samples formed can be seen as model hydrodenitrogenation (HDN) catalysts, but the more-controlled surface morphology allows spectral features to be studied in the absence of charging effects that can interfere with such measurements on high-area samples. Observed core level and valence spectra are consistent with the MoO3 being reduced, but the degree of reduction depends on the reaction temperature. Heating to 350 degrees C indicates some conversion to Mo(+5) and 'O-rich' Mo(+4) components, while heating to 450 degrees C and to 700 degrees C give respectively a 'N-rich' Mo(+4) form and a Mo(+3) oxynitride as the dominant components. It is concluded that the nitridation of MoO3 by NH3 involves initial hydrogenation, with subsequent elimination of water, and the effective replacement of O by N as the reduction continues. Surface compositions determined here during the nitridation process contrast with conclusions reached previously for the evolution of bulk phases as deduced by X-ray diffraction. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:147 / 158
页数:12
相关论文
共 50 条
  • [31] X-ray photoelectron and X-ray Auger electron spectroscopy studies of heavy ion irradiated C60 films
    Kumar, Amit
    Singh, F.
    Govind
    Shivaprasad, S. M.
    Avasthi, D. K.
    Pivin, J. C.
    APPLIED SURFACE SCIENCE, 2008, 254 (22) : 7280 - 7284
  • [32] Electrostatic immobilization of polyoxometallates on silicon: X-ray Photoelectron Spectroscopy and electrochemical studies
    Fleury, Benoit
    Billon, Martial
    Duclairoir, Florence
    Dubois, Lionel
    Fanton, Aurelien
    Bidan, Gerard
    THIN SOLID FILMS, 2011, 519 (11) : 3732 - 3738
  • [33] X-ray photoelectron spectroscopy study on Ba1-xEuxTiO3
    Lu, DY
    Sugano, M
    Sun, XY
    Su, WH
    APPLIED SURFACE SCIENCE, 2005, 242 (3-4) : 318 - 325
  • [34] X-ray Photoelectron Spectroscopy study of CaV1-xMoxO3-δ
    Belyakov, S. A.
    Kuznetsov, M. V.
    Shkerin, S. N.
    JOURNAL OF SOLID STATE CHEMISTRY, 2018, 262 : 301 - 308
  • [35] X-ray photoelectron spectroscopy and magnetism of GdNi3Al16
    Coldea, M
    Pop, V
    Neumann, M
    Chiuzbaian, SG
    Todoran, D
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2002, 242 : 864 - 866
  • [36] X-ray photoelectron spectroscopy studies of TixAl1-xN thin films prepared by RF reactive magnetron sputtering
    Xiong, R
    Shi, J
    JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 2005, 21 (04) : 541 - 544
  • [37] X-ray photoelectron spectroscopy studies of Ag-doped thin amorphous GexSb40-xS60 films
    Debnath, RK
    Fitzgerald, AG
    Christova, K
    APPLIED SURFACE SCIENCE, 2002, 202 (3-4) : 261 - 265
  • [38] High resolution X-ray photoelectron spectroscopy of 3-mercaptopropionic acid self-assembled films
    Gonella, G
    Cavalleri, O
    Terreni, S
    Cvetko, D
    Floreano, L
    Morgante, A
    Canepa, M
    Rolandi, R
    SURFACE SCIENCE, 2004, 566 : 638 - 643
  • [39] X-ray absorption near the edge structure and x-ray photoelectron spectroscopy studies on pyrite prepared by thermally sulfurizing iron films
    张辉
    刘应书
    王宝义
    魏龙
    奎热西
    钱海杰
    ChinesePhysicsB, 2009, 18 (07) : 2734 - 2738
  • [40] In-doped As2Se3 thin films studied by Raman and X-ray photoelectron spectroscopies
    Azhniuk, Yuriy
    Dzhagan, Volodymyr
    Solonenko, Dmytro
    Loya, Vasyl
    Grytsyshche, Iaroslav
    Lopushansky, Vasyl
    Gomonnai, Alexander
    Zahn, Dietrich R. T.
    APPLIED SURFACE SCIENCE, 2019, 471 : 943 - 949