Supercritical lens array in a centimeter scale patterned with maskless UV lithography

被引：31

作者：

Zhu, Xufeng ^{[1
,2
]}

Fang, Wei ^{[1
]}

Lei, Jian ^{[1
]}

Li, Zhangyin ^{[1
]}

Xie, Fei ^{[1
]}

Cao, Yaoyu ^{[1
]}

Zhang, Yaping ^{[2
]}

Qin, Fei ^{[1
]}

Li, Xiangping ^{[1
]}

机构：

[1] Jinan Univ, Inst Photon Technol, Guangdong Prov Key Lab Opt Fiber Sensing & Commun, Guangzhou 510632, Peoples R China

[2] Kunming Univ Sci & Technol, Key Lab Laser Informat Proc Technol & Applicat, Kunming 650500, Yunnan, Peoples R China

来源：

OPTICS LETTERS | 2020年 / 45卷 / 07期

基金：

中国国家自然科学基金;

关键词：

SUPER-OSCILLATORY LENS; OPTIMIZATION;

D O I：

10.1364/OL.389702

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Microlens arrays (MLAs) are widely used in optical imaging, dense wavelength division multiplexing, optical switching, and microstructure patterning, etc. However, the light modulation capability for both the conventional refractive-type MLA and planar diffractive-type MLA is still staying at the diffraction-limited scale. Here we propose and experimentally demonstrate a high numerical aperture (NA) supercritical lens (SCL) array which could achieve a sub-diffraction-limited focal spot lattice in the far field. The intensity distribution for all the focal spots has good uniformity with the lateral size around 0.45 lambda/NA (0.75X Airy unit). The elementary unit in the SCL array composes a series of concentric belts with a feature size in micrometer scale. By utilizing an ultrafast ultraviolet lithography technique, a centimeter scale SCL array could be successfully patterned within 10 mins. Our results may provide possibilities for the applications in optical nanofabrication, super-resolution imaging, and ultrafine optical manipulation. (C) 2020 Optical Society of America

引用

页码：1798 / 1801

页数：4