Interaction of NO with SiOx/TiO2 (110)-(1 x 2)

被引：2
作者：
Caravaca, Manuel [1 ]
Jorge Morales, Jose [2 ]
Abad, Jose [2 ]
机构：
[1] Spanish Air Force Acad, Univ Ctr Def, San Javier 30720, Spain
[2] Tech Univ Cartagena, Dept Appl Phys, Campus Muralla Mar, Cartagena 30202, Spain
来源：
APPLIED SURFACE SCIENCE | 2021年 / 551卷 / 551期
关键词：
Dissociative adsorption; Rutile; Nitric oxide; Silicon; DISSOCIATIVE ADSORPTION; NITRIC-OXIDE; SURFACE; GROWTH; ENERGY; SILICA; STATES;
D O I：
10.1016/j.apsusc.2021.149415
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The interaction of nitrogen monoxide (NO) with 0.8 monolayer of silicon, deposited onto rutile single crystal surface SiOx/TiO2 (110)-(1 x 2), has been studied by means of X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS), and Auger electron spectroscopy (AES), in order to characterize the interaction of NO, up to 200 langmuir at room temperature, with the SiOx/TiO2 interface. This interaction resulted in the oxidation of titanium species, as well as a weak reduction of silicon species. Furthermore, adsorbed nitrogen is not detected on the surface. These results suggest that the adsorption is dissociative, characterized by a Freundlich isotherm.
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页数：5
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