Adapted parameterization of incomplete ionization in aluminum-doped silicon and impact on numerical device simulation

被引:20
|
作者
Steinkemper, Heiko [1 ]
Rauer, Michael [1 ]
Altermatt, Pietro [2 ]
Heinz, Friedemann D. [1 ]
Schmiga, Christian [1 ]
Hermle, Martin [1 ]
机构
[1] Fraunhofer Inst Solar Energy Syst ISE, D-79110 Freiburg, Germany
[2] Leibniz Univ Hannover, Inst Solid State Phys, Dept Solar Energy, D-30167 Hannover, Germany
关键词
ELECTRICAL-PROPERTIES; HOLE MOBILITY; SI;
D O I
10.1063/1.4913255
中图分类号
O59 [应用物理学];
学科分类号
摘要
The amount of incomplete ionization of aluminum-doped silicon is measured at room temperature by comparing electrochemical capacitance-voltage measurements with micro Raman spectroscopy. It is shown that commonly used parameterizations significantly underestimate the effect of incomplete ionization in Al doped Si. Based on the experimental data, we propose new parameter values for the parameterization of incomplete ionization given in Altermatt et al., J. Appl. Phys. 100, 113715 (2006). Using these new values, the saturation current density J(0,p+) of the Al-alloyed region of a standard silicon solar cell is determined by means of numerical device modeling. It is shown that the parameterization influences J(0,p+) significantly. Additionally, the weakening effect of incomplete ionization on band gap narrowing (BGN) should be taken into account in modeling that aims to predict device behavior after changes made to the Al-alloyed region. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:8
相关论文
共 50 条
  • [21] AC susceptibility study of superconducting aluminum-doped silicon carbide
    Kriener, M.
    Muranaka, T.
    Akimitsu, J.
    Maeno, Y.
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2010, 470 : S602 - S603
  • [22] THERMAL DONOR GENERATION IN BORON-DOPED AND ALUMINUM-DOPED CZOCHRALSKI SILICON
    KOPALKO, K
    KACZOR, P
    GODLEWSKI, M
    GREGORKIEWICZ, T
    ACTA PHYSICA POLONICA A, 1991, 80 (03) : 345 - 348
  • [23] PHOTOLUMINESCENCE STUDIES ON THERMAL DONORS IN BORON-DOPED AND ALUMINUM-DOPED SILICON
    LIESERT, BJH
    GREGORKIEWICZ, T
    AMMERLAAN, CAJ
    PHYSICAL REVIEW B, 1992, 46 (04): : 2034 - 2040
  • [24] Preparation and characterization of aluminum-doped silicon carbide by combustion synthesis
    Li, Zhimin
    Zhou, Wancheng
    Su, Xiaolei
    Luo, Fa
    Zhu, Dongmei
    Liu, Pengle
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2008, 91 (08) : 2607 - 2610
  • [25] LUMINESCENCE OF SCANDIUM- AND ALUMINUM-DOPED SILICON CARBIDE.
    Andreev, A.P.
    Safaraliev, G.K.
    Tairov, Yu.M.
    Tsvetkov, V.F.
    Soviet Physics, Semiconductors (English translation of Fizika i Tekhnika Poluprovodnikov), 1975, 9 (08):
  • [26] Periodic density fluctuations in sputtered aluminum-doped silicon oxynitride layers
    Roch, Tomas
    Simurka, Lukas
    Ow-Yang, Cleva W.
    Sezen, Meltem
    Satrapinskyy, Leonid
    Turutoglu, Tuncay
    INTERNATIONAL JOURNAL OF APPLIED GLASS SCIENCE, 2020, 11 (01) : 207 - 214
  • [27] GRAIN-BOUNDARY SEGREGATION IN ALUMINUM-DOPED SILICON-CARBIDE
    TAJIMA, Y
    KINGERY, WD
    JOURNAL OF MATERIALS SCIENCE, 1982, 17 (08) : 2289 - 2297
  • [28] RECOMBINATION CENTERS IN ALUMINUM-DOPED SILICON DIFFUSED IN HIGH PHOSPHORUS CONCENTRATION
    MARCHAND, RL
    STIVERS, AR
    SAH, CT
    JOURNAL OF APPLIED PHYSICS, 1977, 48 (06) : 2576 - 2580
  • [29] Early Stages of Aluminum-Doped Zinc Oxide Growth on Silicon Nanowires
    Borgh, Giovanni
    Bongiorno, Corrado
    Cosentino, Salvatore
    La Magna, Antonino
    Patane, Salvatore
    Scalese, Silvia
    Terrasi, Antonio
    Torrisi, Giacomo
    Puglisi, Rosaria A.
    NANOMATERIALS, 2022, 12 (05)
  • [30] BISTABLE BEHAVIOR OF THE NEW SHALLOW THERMAL DONOR IN ALUMINUM-DOPED SILICON
    KACZOR, P
    GODLEWSKI, M
    GREGORKIEWICZ, T
    ACTA PHYSICA POLONICA A, 1993, 84 (03) : 555 - 558