Adapted parameterization of incomplete ionization in aluminum-doped silicon and impact on numerical device simulation

被引:20
|
作者
Steinkemper, Heiko [1 ]
Rauer, Michael [1 ]
Altermatt, Pietro [2 ]
Heinz, Friedemann D. [1 ]
Schmiga, Christian [1 ]
Hermle, Martin [1 ]
机构
[1] Fraunhofer Inst Solar Energy Syst ISE, D-79110 Freiburg, Germany
[2] Leibniz Univ Hannover, Inst Solid State Phys, Dept Solar Energy, D-30167 Hannover, Germany
关键词
ELECTRICAL-PROPERTIES; HOLE MOBILITY; SI;
D O I
10.1063/1.4913255
中图分类号
O59 [应用物理学];
学科分类号
摘要
The amount of incomplete ionization of aluminum-doped silicon is measured at room temperature by comparing electrochemical capacitance-voltage measurements with micro Raman spectroscopy. It is shown that commonly used parameterizations significantly underestimate the effect of incomplete ionization in Al doped Si. Based on the experimental data, we propose new parameter values for the parameterization of incomplete ionization given in Altermatt et al., J. Appl. Phys. 100, 113715 (2006). Using these new values, the saturation current density J(0,p+) of the Al-alloyed region of a standard silicon solar cell is determined by means of numerical device modeling. It is shown that the parameterization influences J(0,p+) significantly. Additionally, the weakening effect of incomplete ionization on band gap narrowing (BGN) should be taken into account in modeling that aims to predict device behavior after changes made to the Al-alloyed region. (C) 2015 AIP Publishing LLC.
引用
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页数:8
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