A SPICE model for thin-film transistors fabricated on grain-enhanced polysilicon film

被引:15
作者
Jagar, S [1 ]
Cheng, CF [1 ]
Zhang, SD [1 ]
Wang, HM [1 ]
Poon, MC [1 ]
Kok, CW [1 ]
Chan, MS [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China
关键词
BSIM and SPICE; GBs; MILC; polysilicon; TFT modeling and circuit simulation; thin-film transistors;
D O I
10.1109/TED.2003.812487
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A simulation program with integrated circuit emphasis (SPICE)-compatible thin-film transistor (TFT) model for TFTs formed on grain-enhanced polysilicon (poly-Si) film by metal-induced-unilateral crystallization (MIUC) is presented. Due to the regularity of grain structures resulting from the MIUC process, the GBs are organized into a manhattan grid. The specific grain boundary (GB) organization allows a physics-based model to be developed. The model is based on the popular BSIM3 submicron CMOS model framework, which captures most of the physical effects in both long channel and short channel down to the submicron dimension., The model has been verified by a large amount of experimental data and shown to be applicable over a wide range of TFT processes with the application of grain-enhancement techniques such as solid-phase crystallization (SPC) and MIUC.
引用
收藏
页码:1103 / 1108
页数:6
相关论文
共 20 条
  • [1] Modeling of laser-annealed polysilicon TFT characteristics
    Armstrong, GA
    Uppal, S
    Brotherton, SD
    Ayres, JR
    [J]. IEEE ELECTRON DEVICE LETTERS, 1997, 18 (07) : 315 - 318
  • [2] Plasma hydrogenation of metal-induced laterally crystallized thin film transistors
    Bhat, G
    Kwok, H
    Wong, M
    [J]. IEEE ELECTRON DEVICE LETTERS, 2000, 21 (02) : 73 - 75
  • [3] CHENG Y, 1995, BSIM3 VERSION 3 0 MA
  • [4] A physically-based built-in Spice Poly-Si TFT model for circuit simulation and reliability evaluation
    Chung, SS
    Chen, DC
    Cheng, CT
    Yeh, CF
    [J]. IEDM - INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST 1996, 1996, : 139 - 142
  • [5] On-current modeling of large-grain polycrystalline silicon thin-film transistors
    Farmakis, FV
    Brini, J
    Kamarinos, G
    Angelis, CT
    Dimitriadis, CA
    Miyasaka, M
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (04) : 701 - 706
  • [6] Design methodology of the high performance large-grain polysilicon MOSFET
    Jagar, S
    Wang, HM
    Chan, MS
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2002, 49 (05) : 795 - 801
  • [7] Effects of longitudinal and latitudinal grain boundaries on the performance of large-grain polysilicon MOSFET
    Jagar, S
    Wang, H
    Chun, M
    [J]. IEEE ELECTRON DEVICE LETTERS, 2001, 22 (05) : 218 - 220
  • [8] CHARACTERISTICS OF POLYCRYSTALLINE-SI THIN-FILM TRANSISTORS FABRICATED BY EXCIMER-LASER ANNEALING METHOD
    KUBO, N
    KUSUMOTO, N
    INUSHIMA, T
    YAMAZAKI, S
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (10) : 1876 - 1879
  • [9] Lee SW, 1996, IEEE ELECTR DEVICE L, V17, P160, DOI 10.1109/55.485160
  • [10] CONDUCTIVITY BEHAVIOR IN POLYCRYSTALLINE SEMICONDUCTOR THIN-FILM TRANSISTORS
    LEVINSON, J
    SHEPHERD, FR
    SCANLON, PJ
    WESTWOOD, WD
    ESTE, G
    RIDER, M
    [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (02) : 1193 - 1202