RF CMOS on high-resistivity substrates for system-on-chip applications

被引:67
作者
Benaissa, K [1 ]
Yang, JY [1 ]
Crenshaw, D [1 ]
Williams, B [1 ]
Sridhar, S [1 ]
Ai, J [1 ]
Boselli, G [1 ]
Zhao, S [1 ]
Tang, SP [1 ]
Ashburn, S [1 ]
Madhani, P [1 ]
Blythe, T [1 ]
Mahalingam, N [1 ]
Shichijo, H [1 ]
机构
[1] Texas Instruments Inc, Dallas, TX 75243 USA
关键词
D O I
10.1109/TED.2003.810470
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The use of high-resistivity substrate extends the capability of standard digital CMOS technology to enable the integration of high-performance RF passive components. The impact of substrate resistivity on the key components of RF CMOS for system-on-chip (SOC) applications is discussed. The comparison includes the transistor, transmission line, inductor, capacitor and varactor, as well as the noise isolation., We also discuss the integration issues including latch-up and well-well isolation in a 0.35-mum Cu metal pitch, 0.1-mum-gate-length RF CMOS technology.
引用
收藏
页码:567 / 576
页数:10
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