Low-Frequency Noise Parameter Extraction Method for Single-Layer Graphene FETs

被引:10
|
作者
Mavredakis, Nikolaos [1 ]
Wei, Wei [2 ]
Pallecchi, Emiliano [2 ]
Vignaud, Dominique [2 ]
Happy, Henri [2 ]
Garcia Cortadella, Ramon [3 ]
Schaefer, Nathan [3 ]
Bonaccini Calia, Andrea [3 ]
Antonio Garrido, Jose [3 ]
Jimenez, David [1 ]
机构
[1] Univ Autonoma Barcelona, Escola Engn, Dept Engn Elect, Bellaterra 08193, Spain
[2] Univ Lille, IEMN, UMR 8520, CNRS, F-59000 Lille, France
[3] CSIC, Catalan Inst Nanosci & Nanotechnol ICN2, Barcelona Inst Sci & Technol, Campus UAB, Barcelona 08193, Spain
基金
欧盟地平线“2020”;
关键词
Compact model; graphene transistor (GFET); low-frequency noise (LFN); parameter extraction; single layer (SL); 1/F NOISE; TRANSISTORS; FLUCTUATIONS;
D O I
10.1109/TED.2020.2978215
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article, a detailed parameter extraction methodology is proposed for low-frequency noise (LFN) in single-layer (SL) graphene transistors (GFETs) based on a recently established compact LFN model. The drain current and LFN of two short channel back-gated GFETs (L = 300 and 100 nm) were measured at lower and higher drain voltages, for a wide range of gate voltages covering the region away from charge neutrality point (CNP) up to CNP at p-type operation region. Current-voltage (IV) and LFN data were also available from a long-channel SL top solution-gated (SG) GFET (L = 5 mu m), for both p- and n-type regions near and away CNP. At each of these regimes, the appropriate IV and LFN parameters can be accurately extracted. Regarding LFN, mobility fluctuation effect is dominant at CNP, and from there, the Hooge parameter alpha(H) can be extracted, whereas the carrier number fluctuation contribution which is responsible for the well-known M-shape bias dependence of output noise divided by squared drain current, also observed in our data, makes possible the extraction of the N-T parameter related to the number of traps. In the less possible case of a Lambda-shape trend, NT and alpha(H) can be extracted simultaneously from the region near CNP. Away from CNP, contact resistance can have a significant contribution to LFN, and from there, the relevant parameter S-Delta R(2) is defined. The LFN parameters described above can be estimated from the low drain voltage region of operation where the effect of velocity saturation (VS) mechanism is negligible. VS effect results in the reduction of LFN at higher drain voltages, and from there, the IV parameter h Omega which represents the phonon energy and is related to VS effect can be derived both from drain current and LFN data.
引用
收藏
页码:2093 / 2099
页数:7
相关论文
共 50 条
  • [1] Bias dependent variability of low-frequency noise in single-layer graphene FETs
    Mavredakis, Nikolaos
    Garcia Cortadella, Ramon
    Illa, Xavi
    Schaefer, Nathan
    Bonaccini Calia, Andrea
    Anton-Guimera-Brunet
    Garrido, Jose A.
    Jimenez, David
    NANOSCALE ADVANCES, 2020, 2 (11): : 5450 - 5460
  • [2] Input-Referred Low-Frequency Noise Analysis for Single-Layer Graphene FETs
    Mavredakis, Nikolaos
    Jimenez, David
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2021, 68 (09) : 4762 - 4765
  • [3] Low-frequency noise in irradiated graphene FETs
    Wu, Ting
    Alharbi, Abdullah
    Taniguchi, Takashi
    Watanabe, Kenji
    Shahrjerdi, Davood
    APPLIED PHYSICS LETTERS, 2018, 113 (19)
  • [4] Low-frequency electronic noise in the double-gate single-layer graphene transistors
    Liu, G.
    Stillman, W.
    Rumyantsev, S.
    Shao, Q.
    Shur, M.
    Balandin, A. A.
    APPLIED PHYSICS LETTERS, 2009, 95 (03)
  • [5] Understanding the bias dependence of low frequency noise in single layer graphene FETs
    Mavredakis, Nikotaos
    Garcia Cortadella, Ramon
    Bonaccini Calia, Andrea
    Garrido, Jose A.
    Jimenez, David
    NANOSCALE, 2018, 10 (31) : 14947 - 14956
  • [6] Low-Frequency Electronic Noise in Single-Layer MoS2 Transistors
    Sangwan, Vinod K.
    Arnold, Heather N.
    Jariwala, Deep
    Marks, Tobin J.
    Lauhon, Lincoln J.
    Hersam, Mark C.
    NANO LETTERS, 2013, 13 (09) : 4351 - 4355
  • [7] Characterization and Modeling of Low-frequency Noise in CVD-grown Graphene FETs
    Mukherjee, C.
    Aguirre-Morales, J. D.
    Fregonese, S.
    Zimmer, T.
    Maneux, C.
    Happy, H.
    Wei, W.
    ESSDERC 2015 PROCEEDINGS OF THE 45TH EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE, 2015, : 176 - 179
  • [8] MEASUREMENTS AND INTERPRETATION OF LOW-FREQUENCY NOISE IN FETS
    DAS, MB
    MOORE, JM
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1974, ED21 (04) : 247 - 257
  • [9] Straightforward bias- and frequency-dependent small-signal model extraction for single-layer graphene FETs
    Mavredakis, Nikolaos
    Pacheco-Sanchez, Anibal
    Wei, Wei
    Pallecchi, Emiliano
    Happy, Henri
    Jimenez, David
    MICROELECTRONICS JOURNAL, 2023, 133
  • [10] LOW-FREQUENCY NOISE MEASUREMENTS OF GAAS-FETS
    RIDDLE, AN
    TREW, RJ
    MICROWAVE JOURNAL, 1986, 29 (05) : 64 - 64