Nanocrystalline growth and grain-size effects in Au-Cu electrodeposits

被引:29
作者
Jankowski, AF
Saw, CK
Harper, JF
Vallier, BF
Ferreira, JL
Hayes, JP
机构
[1] Lawrence Livermore Natl Lab, Div Mat Sci & Technol, Livermore, CA 94550 USA
[2] Lawrence Livermore Natl Lab, New Technol Engn Div, Livermore, CA 94550 USA
关键词
nanostructures; growth mechanism; structural properties; deposition process;
D O I
10.1016/j.tsf.2005.08.149
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The processing-structure-property relationship is investigated for electrodeposited foils of the gold-copper alloy system. A model is presented that relates the deposition process parameters to the nanocrystalline grain size. An activation energy of 1.52 eV atom(-1) for growth is determined for a long-pulse (> 10 msec) mode, and is 0.16 eV atom(-1) for short pulses (< 5 msec). The effect of nanocrystalline grain size on the mechanical properties is assessed using indentation measurements. A Hall-Petch type variation of the Vickers microhardness with nanocrystalline grain size (> 6 nm) is observed for Au-Cu samples with 1-12 wt.% Cu as tested in cross-section. The hardness increases three-fold from a rule-of-mixtures value <1 GPa to a maximum of 2.9 GPa. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:268 / 273
页数:6
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