Phosphorous diffusion gettering of n-type CZ silicon wafers for improving the performances of silicon heterojunction solar cells

被引:10
作者
Zhu, Fangzhou [1 ,2 ]
Wang, Dongliang [3 ]
Bian, Jiantao [1 ]
Liu, Jinning [1 ]
Liu, Zhengxin [1 ,2 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr New Energy Technol, Shanghai 201800, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] State Key Lab Photovolta Sci & Technol SKL PVST, Trinasolar 213031, Changzhou, Peoples R China
基金
国家高技术研究发展计划(863计划);
关键词
Phosphorus diffusion gettering; n-type silicon wafer; Minority carrier lifetime; Heterojunction solar cell; IRON;
D O I
10.1016/j.solmat.2016.05.023
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Phosphorous diffusion gettering (PDG) for different kinds of commercial n-type CZ silicon wafers was investigated for the application in silicon heterojunction (SHJ) solar cells. It was found that surplus phosphorus diffusion was effective in improving the effective minority carrier lifetime (tau(eff)). Highest tau(eff) was obtained at the optimal diffusion temperature of 840 degrees C, which was almost independent on the diffusion duration at a wide region from 5 to 60 min, corresponding to a sheet resistance region from 85 to 21 Omega/sq. The segregation coefficient and gettering sites were considered responsible for the gettering mechanism. When the optimized PDG process was applied to SHJ solar cells with three different groups of commercial Si wafers, the average efficiencies were improved from 21.2% to 22.4%, 21.5% to 22.4%, and 22.1% to 22.5%, respectively, where the efficiency gains were mainly contributed by the improvements of open-circuit voltage and fill factor. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:74 / 78
页数:5
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