Study of the conductivity of nitrogen doped tetrahedral amorphous carbon films

被引：19
作者：
Liu, Shu
Wang, Guangfu
Wang, Zhenghao [1 ]
机构：
[1] Beijing Normal Univ, Dept Chem, Beijing 100875, Peoples R China
[2] Beijing Normal Univ, Analyt & Testing Ctr, Beijing 100875, Peoples R China
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 2007年 / 353卷 / 29期
基金：
中国国家自然科学基金;
关键词：
amorphous carbon; electrical conductivity; photoconductivity;
D O I：
10.1016/j.jnoncrysol.2007.05.021
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The conductivity of nitrogen incorporated tetrahedral amorphous carbon (taC:N) films prepared by filtered cathodic vacuum arc (FCVA) system was studied. The film resistivity varied as a function of nitrogen content in a wide nitrogen content range from 1 to 23 at.%. An interesting phenomenon of the photoconductivity for the films was found, that the resistivity of those films with low nitrogen content (< 5 at.%) increased due to the light irradiation. This kind of behavior of photoconductivity had not been discussed in previous papers on taC:N films. (c) 2007 Elsevier B.V. All rights reserved.
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收藏
页码：2796 / 2798
页数：3
相关论文
共 21 条
[1]   Infrared analysis of deuterated carbon-nitrogen films obtained by dual-ion-beam-assisted-deposition [J].
Alvarez, F ;
Victoria, NM ;
Hammer, P ;
Freire, FL ;
dos Santos, MC .
APPLIED PHYSICS LETTERS, 1998, 73 (08) :1065-1067
[2]  
AMARATUNGA GAJ, 1993, J NONCRYST SOLIDS, V164, P1119
[3]   Properties of nitrogen doped tetrahedral amorphous carbon films prepared by filtered cathodic vacuum are technique [J].
Cheah, LK ;
Shi, X ;
Shi, JR ;
Liu, EJ ;
Silva, SRP .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 242 (01) :40-48
[4]   Electrical properties of nitrogen incorporated tetrahedral amorphous carbon films [J].
Chen, ZY ;
Yu, YH ;
Zhao, JP ;
Yang, SQ ;
Shi, TS ;
Liu, XH ;
Luo, EZ ;
Xu, JB ;
Wilson, IH .
THIN SOLID FILMS, 1999, 339 (1-2) :74-77
[5]  
Guangfu W., 2000, Surface and Coatings Technology, V128-129, P470, DOI 10.1016/S0257-8972(00)00620-4
[6]  
GUANGFU W, 2000, SURF COAT TECH, V129, P470
[7]   Bonding regimes of nitrogen in amorphous carbon [J].
Kleinsorge, B ;
Ferrari, AC ;
Robertson, J ;
Milne, WI ;
Waidmann, S ;
Hearne, S .
DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) :643-648
[8]   The effect of implantation temperature on the surface hardness, elastic modulus and Raman scattering in amorphous carbon [J].
Lee, DH ;
Lee, H ;
Park, B ;
Poker, DB ;
Riester, L .
APPLIED PHYSICS LETTERS, 1997, 70 (23) :3104-3106
[9]   Electrical properties of reactively sputtered carbon nitride films [J].
Monclus, MA ;
Cameron, DC ;
Barklie, R ;
Collins, M .
SURFACE & COATINGS TECHNOLOGY, 1999, 116 :54-58
[10]   Preparation and properties of photoconductive amorphous carbon nitride a-CNx films:: the layer-by-layer method [J].
Nitta, S ;
Takada, N ;
Sugiyama, K ;
Itoh, T ;
Nonomura, S .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 227 :655-658
123