Spatially resolved optical emission spectroscopy of pulse magnetron sputtering discharge

被引：12
作者：
Kim, YM
Jung, MJ
Oh, SG
Han, JG
机构：
[1] Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South Korea
[2] Ajou Univ, Dept Phys, Suwon 442749, South Korea
来源：
THIN SOLID FILMS | 2005年 / 475卷 / 1-2期
关键词：
pulsed plasma; reactive magnetron sputtering; spatially resolved OES; DEPOSITION; POWER; DC; DISTRIBUTIONS; IONIZATION;
D O I：
10.1016/j.tsf.2004.07.020
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The spatially resolved optical emission spectroscopy of various species of a pulse DC unbalanced magnetron sputtering is studied. Ar-N-2 gas mixtures are used. Emission lines corresponding to titanium cathode and gas discharge species are considered. In this study, the two-dimensional (2-D) emission profiles of the lines are measured by an ICCD camera during TiN coatings. It turns out that the 2-D emission profiles of the various lines behave differently. As a result, we obtained the surface roughness value of RMS 2.3 nm at higher pulse frequency and 3.8 nm at lower pulse duty cycle. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码：91 / 96
页数：6
相关论文
共 27 条
[1]   Measured energy distributions of ions driven by an asymmetrically pulsed bias during magnetron sputtering [J].
Barnat, EV ;
Lu, TM .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (06) :2984-2989
[2]   Pulse duration effects in pulse-power reactive sputtering of Al2O3 [J].
Belkind, A ;
Freilich, A ;
Scholl, R .
SURFACE & COATINGS TECHNOLOGY, 1998, 108 (1-3) :558-563
[3]   Using pulsed direct current power for reactive sputtering of AL2O3 [J].
Belkind, A ;
Freillich, A ;
Scholl, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (04) :1934-1940
[4]   A spatially resolved spectroscopic study of ionization in the planar magnetron discharge [J].
Christou, C ;
Barber, ZH .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (01) :37-46
[5]   Spectroscopic optical emission tomography of direct-current magnetron sputtering discharges in argon-nitrogen gas mixtures [J].
Debal, F ;
Wautelet, M ;
Dauchot, JP ;
Hecq, M .
SURFACE & COATINGS TECHNOLOGY, 1999, 116 :927-932
[6]   Spatially-resolved spectroscopic optical emission of dc-magnetron sputtering discharges in argon-nitrogen gas mixtures [J].
Debal, F ;
Wautelet, M ;
Bretagne, J ;
Dauchot, JP ;
Hecq, M .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (02) :152-160
[7]   Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films [J].
Gautier, C ;
Moulard, G ;
Chatelon, JP ;
Motyl, G .
THIN SOLID FILMS, 2001, 384 (01) :102-108
[8]   Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge [J].
Gudmundsson, JT ;
Alami, J ;
Helmersson, U .
SURFACE & COATINGS TECHNOLOGY, 2002, 161 (2-3) :249-256
[9]   The effect of pulsed magnetron sputtering on the properties of indium tin oxide thin films [J].
Hwang, MS ;
Lee, HJ ;
Jeong, HS ;
Seo, YW ;
Kwon, SJ .
SURFACE & COATINGS TECHNOLOGY, 2003, 171 (1-3) :29-33
[10]   Deposition of TiOx thin film using the grid-assisting magnetron sputtering [J].
Jung, MJ ;
Kim, YM ;
Chung, YM ;
Han, JG ;
Bang, KY .
THIN SOLID FILMS, 2004, 447 :430-435
123