Investigation of nitride MOVPE at high pressure and high growth rates in large production reactors by a combined modelling and experimental approach

被引:13
作者
Dauelsberg, M. [1 ]
Brien, D. [1 ]
Puesche, R. [1 ]
Schoen, O. [1 ]
Yakovlev, E. V. [2 ]
Segal, A. S. [2 ]
Talalaev, R. A. [2 ]
机构
[1] AIXTRON AG, D-52134 Herzogenrath, Germany
[2] Soft Impact Ltd, STR Grp, St Petersburg 194156, Russia
关键词
Computer simulation; Gas phase kinetics; Metalorganic vapor phase epitaxy; Nitrides; VAPOR-PHASE EPITAXY; GAN;
D O I
10.1016/j.jcrysgro.2010.07.064
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The impact on growth efficiency and growth profiles of gas phase nucleation phenomena during MOVPE of GaN is investigated by a series of growth runs in a production scale Planetary Reactor (R). Parameter variations are carried out to distinguish between the effects of pressure, metalorganic precursor partial pressure, residence time and thermal ambient. The results are used to validate and refine a computational model describing gas phase reaction kinetics and nucleation dynamics. Modelling is used to elucidate critical routes of depletion by gas phase nucleation. The control of these processes has led the way to uniform layer growth over 6 inch wafers at high pressure and high growth rates in a larger next generation Planetary Reactor (R). (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:224 / 228
页数:5
相关论文
共 10 条
  • [1] Modeling the parasitic chemical reactions of AlGaN organometallic vapor-phase epitaxy
    Coltrin, ME
    Creighton, JR
    Mitchell, CC
    [J]. JOURNAL OF CRYSTAL GROWTH, 2006, 287 (02) : 566 - 571
  • [2] Nature of the parasitic chemistry during AlGaInNOMVPE
    Creighton, JR
    Wang, GT
    Breiland, WG
    Coltrin, ME
    [J]. JOURNAL OF CRYSTAL GROWTH, 2004, 261 (2-3) : 204 - 213
  • [3] Modeling and process design of III-nitride MOVPE at near-atmospheric pressure in close coupled showerhead and planetary reactors
    Dauelsberg, M.
    Martin, C.
    Protzmann, H.
    Boyd, A. R.
    Thrush, E. J.
    Kaeppeler, J.
    Heuken, M.
    Talalaev, R. A.
    Yakovlev, E. V.
    Kondratyev, A. V.
    [J]. JOURNAL OF CRYSTAL GROWTH, 2007, 298 (SPEC. ISS) : 418 - 424
  • [4] Modeling of reaction pathways of GaN growth by metalorganic vapor-phase epitaxy using TMGa/NH3/H2 system:: A computational fluid dynamics simulation study
    Hirako, A
    Kusakabe, K
    Ohkawa, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (02): : 874 - 879
  • [5] Effects of reactor pressure and residence time on GaN MOVPE growth efficiency
    Lundin, WV
    Zavarin, EE
    Sizov, DS
    Sinitsin, MA
    Tsatsul'nikov, AF
    Kondratyev, AV
    Yakovlev, EV
    Talalaev, RA
    [J]. JOURNAL OF CRYSTAL GROWTH, 2006, 287 (02) : 605 - 609
  • [6] High growth rate metal organic vapor phase epitaxy GaN
    Matsumoto, Koh
    Tokunaga, Hiroki
    Ubukata, Akinori
    Ikenaga, Kazumasa
    Fukuda, Yasushi
    Tabuchi, Toshiya
    Kitamura, Yuichiro
    Koseki, Shuichi
    Yamaguchi, Akira
    Uematsu, Kunimasa
    [J]. JOURNAL OF CRYSTAL GROWTH, 2008, 310 (17) : 3950 - 3952
  • [7] A reaction-transport model for AlGaN MOVPE growth
    Mihopoulos, TG
    Gupta, V
    Jensen, KF
    [J]. JOURNAL OF CRYSTAL GROWTH, 1998, 195 (1-4) : 733 - 739
  • [8] On low temperature kinetic effects in metal-organic vapor phase epitaxy of III-V compounds
    Talalaev, RA
    Yakovlev, EV
    Karpov, SY
    Makarov, YN
    [J]. JOURNAL OF CRYSTAL GROWTH, 2001, 230 (1-2) : 232 - 238
  • [9] Numerical study of SiCCVD in a vertical cold-wall reactor
    Vorob'ev, AN
    Karpov, SY
    Bogdanov, MV
    Komissarov, AE
    Bord, OV
    Zhmakin, AI
    Makarov, YN
    [J]. COMPUTATIONAL MATERIALS SCIENCE, 2002, 24 (04) : 520 - 534
  • [10] Hydrogen effects in III-nitride MOVPE
    Yakovlev, E. V.
    Talalaev, R. A.
    Segal, A. S.
    Lobanova, A. V.
    Lundin, W. V.
    Zavarin, E. E.
    Sinitsyn, M. A.
    Tsatsulnikov, A. F.
    Nikolaev, A. E.
    [J]. JOURNAL OF CRYSTAL GROWTH, 2008, 310 (23) : 4862 - 4866