The molar volume of silicon: Discrepancies and limitations
被引:0
作者:
Deslattes, RD
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Gaithersburg, MD 20899 USA
Deslattes, RD
[1
]
Kessler, EG
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Stand & Technol, Gaithersburg, MD 20899 USANatl Inst Stand & Technol, Gaithersburg, MD 20899 USA
Kessler, EG
[1
]
机构:
[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
来源:
1998 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS DIGEST
|
1998年
关键词:
D O I:
10.1109/CPEM.1998.700004
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
A new representation of the current molar volume discrepancy is offered which attends to a previous incorrect account of early NBS work First non-null test results are presented from comparisons of discrepant samples. A discussion of intrinsic limitations of melt grown crystals is included.