Computational Prediction of High Thermoelectric Performance in Hole Doped Layered GeSe

被引:137
作者
Hao, Shiqiang [1 ]
Shi, Fengyuan [1 ]
Dravid, Vinayak P. [1 ]
Kanatzidis, Mercouri G. [2 ]
Wolverton, Christopher [1 ]
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Northwestern Univ, Dept Chem, 2145 Sheridan Rd, Evanston, IL 60201 USA
关键词
2ND VALENCE-BAND; NANOSTRUCTURED THERMOELECTRICS; THERMAL-CONDUCTIVITY; CRYSTALS; SNSE; PBTE; TRANSPORT; FIGURE; MERIT;
D O I
10.1021/acs.chemmater.6b01164
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thermoelectric materials enable direct conversion between thermal and electrical energy and provide a viable route for power generation and electric refrigeration. In this paper, we use first-principles based methods to predict a very high figure of merit (ZT) performance in hole doped GeSe crystals along the crystallographic b-axis, with maximum ZT ranging from 0.8 at 300 K to 2.5 at 800 K. This extremely high thermoelectric performance is due to a threefold synergy of properties in this material: (1) the exceptionally low lattice thermal conductivity in GeSe due to anharmonicity of vibrational modes, (2) the increased electrical conductivity due to hole doping and increased carrier concentration, and (3) an enhanced Seebeck coefficient via a multiband effect induced by hole doping. The predicted ZT results of hole-doped GeSe are higher than that of hole doped SnSe, which we have recently reported as having experimentally observed record-breaking thermoelectric efficiency. The overall ZT of hole doped GeSe crystals outperforms all current state-of-the-art thermoelectric materials, and this work provides an urgent computational materials prediction that is in need of experimental testing.
引用
收藏
页码:3218 / 3226
页数:9
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