Wafer-Level Hermetic Seal Bonding at Low-Temperature with Sub-Micron Gold Particle Using Stencil Printing

被引:1
|
作者
Ishida, H. [1 ]
Ogashiwa, T. [2 ]
机构
[1] SUSS MicroTec KK, Yokohama, Kanagawa 2260006, Japan
[2] Tanaka Kikinzoku Kogyo KK, Hiratsuka, Kanagawa 2540076, Japan
来源
SEMICONDUCTOR WAFER BONDING: SCIENCE, TECHNOLOGY AND APPLICATIONS 14 | 2016年 / 75卷 / 09期
关键词
D O I
10.1149/07509.0265ecst
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Wafer-level low-temperature hermetic seal bonding has been successfully demonstrated using sub-micron-size gold particles (0.3 mu m mean diameter) with adopting a narrow-width rim structure to reduce the required total bonding force down to the range available on commercial wafer bonders. Conventional stencil printing combined with a newly developed suspended metal mask was employed as a cost-effective fabrication method to form sealing lines over the rim structure. Au-Au thermo-compression bonding using 10 ae m-wide rim structure was performed at 200 degrees C for 30 minutes with the bonding pressure of 200 MPa. An excellent hermeticity was achieved and the encapsulated pressure inside the sealed cavity was estimated to be around 100 Pa.
引用
收藏
页码:265 / 272
页数:8
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