Laser Produced Plasma EUV Sources for Device Development and HVM

被引：6

作者：

Brandt, David C. ^{[1
]}

Fomenkov, Igor V. ^{[1
]}

Lercel, Michael J. ^{[1
]}

La Fontaine, Bruno M. ^{[1
]}

Myers, David W. ^{[1
]}

Brown, Daniel J. ^{[1
]}

Ershov, Alex I. ^{[1
]}

Sandstrom, Richard L. ^{[1
]}

Bykanov, Alexander N. ^{[1
]}

Vaschenko, Georgiy O. ^{[1
]}

Boewering, Norbert R. ^{[1
]}

Das, Palash ^{[1
]}

Fleurov, Vladimir B. ^{[1
]}

Zhang, Kevin ^{[1
]}

Srivastava, Shailendra N. ^{[1
]}

Ahmad, Imtiaz ^{[1
]}

Rajyaguru, Chirag ^{[1
]}

De Dea, Silvia ^{[1
]}

Dunstan, Wayne J. ^{[1
]}

Baumgart, Peter ^{[1
]}

Ishihara, Toshi ^{[1
]}

Simmons, Rod D. ^{[1
]}

Jacques, Robert N. ^{[1
]}

Bergstedt, Robert A. ^{[1
]}

Porshnev, Peter I. ^{[1
]}

Wittak, Christopher J. ^{[1
]}

Woolston, Michael R. ^{[1
]}

Rafac, Robert J. ^{[1
]}

Grava, Jonathan ^{[1
]}

Schafgans, Alexander A. ^{[1
]}

Tao, Yezheng ^{[1
]}

机构：

[1] Cymer Inc, San Diego, CA 92127 USA

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III | 2012年 / 8322卷

关键词：

EUV source; EUV lithography; Laser Produced Plasma; Collector; Droplet Generator;

D O I：

10.1117/12.916521

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Laser produced plasma (LPP) systems have been developed as the primary approach for the EUV scanner light source for optical imaging of circuit features at sub-22nm and beyond nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. We present the latest results on exposure power generation, collection, and clean transmission of EUV through the intermediate focus. Semiconductor industry standards for reliability and source availability data are provided. We report on measurements taken using a 5sr normal incidence collector on a production system. The lifetime of the collector mirror is a critical parameter in the development of extreme ultra-violet LPP lithography sources. Deposition of target material as well as sputtering or implantation of incident particles can reduce the reflectivity of the mirror coating during exposure. Debris mitigation techniques are used to inhibit damage from occuring, the protection results of these techniques will be shown over multi-100's of hours.

引用

页数：9

共 9 条

[1] [Anonymous], P SPIE
[2] Performance results of laser-produced plasma test and prototype light sources for EUV lithography
Boewering, Norbert R.
Fomenkov, Igor V.
Brandt, David C.
Bykanov, Alexander N.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Farrar, Nigel R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Hoffman, Jerzy R.
Chrobak, Christopher P.
Srivastava, Shailendra N.
Ahmad, Imtiaz
Rajyaguru, Chirag
Golich, Daniel
Vidusek, David A.
De Dea, Silvia
Hou, Richard R.
[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 8 (04):
[3] Metrology of laser-produced plasma light source for EUV lithography
Böwering, NR
Hoffman, JR
Khodykin, OV
Rettig, CL
Hansson, BAM
Ershov, AI
Fomenkov, IV
[J]. Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3, 2005, 5752 : 1248 - 1256
[4] LPP Source System Development for HVM
Brandt, David C.
Fomenkov, Igor V.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Sandstrom, Richard L.
La Fontaine, Bruno
Lercel, Michael J.
Bykanov, Alexander N.
Boewering, Norbert R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Srivastava, Shailendra N.
Ahmad, Imtiaz
Rajyaguru, Chirag
Das, Palash
Fleurov, Vladimir B.
Zhang, Kevin
Golich, Daniel J.
De Dea, Silvia
Hou, Richard R.
Dunstan, Wayne J.
Wittak, Christian J.
Baumgart, Peter
Ishihara, Toshi
Simmons, Rod D.
Jacques, Robert N.
Bergstedt, Robert A.
[J]. EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY II, 2011, 7969
[5] LPP Source System Development for HVM
Brandt, David C.
Fomenkov, Igor V.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Boewering, Norbert R.
Farrar, Nigel R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Bykanov, Alexander N.
Hoffman, Jerzy R.
Chrobak, Christopher P.
Srivastava, Shailendra N.
Ahmad, Imtiaz
Rajyaguru, Chirag
Golich, Daniel J.
Vidusek, David A.
De Dea, Silvia
Hou, Richard R.
[J]. ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271
[6] Laser Produced Plasma Light Source for EUVL
Fomenkov, Igor V.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Brown, Daniel
Sandstrom, Richard L.
La Fontaine, Bruno
Bykanov, Alexander N.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Boewering, Norbert R.
Das, Palash
Fleurov, Vladimir B.
Zhang, Kevin
Srivastava, Shailendra N.
Ahmad, Imtiaz
Rajyaguru, Chirag
De Dea, Silvia
Hou, Richard R.
Dunstan, Wayne J.
Baumgart, Peter
Ishihara, Toshi
Simmons, Rod D.
Jacques, Robert N.
Bergstedt, Robert A.
Brandt, David C.
[J]. EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY II, 2011, 7969
[7] Laser-Produced Plasma Light Source for EUVL
Fomenkov, Igor V.
Brandt, David C.
Bykanov, Alexander N.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Boewering, Norbert R.
Farrar, Nigel R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Hoffman, Jerzy R.
Chrobak, Christopher P.
Srivastava, Shailendra N.
Golich, Daniel J.
Vidusek, David A.
De Dea, Silvia
Hou, Richard R.
[J]. ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271
[8] Laser-produced plasma source system development
Fomenkov, Igor V.
Brandt, David C.
Bykanov, Alexander N.
Ershov, Alex I.
Partlo, William N.
Myers, David W.
Bbwering, Norbert R.
Vaschenko, Georgiy O.
Khodykin, Oleh V.
Hoffman, Jerzy R.
Vargas, Ernesto
Simmons, Rodney D.
Chavez, Juan A.
Chrobak, Christopher P.
[J]. EMERGING LITHOGRAPHIC TECHNOLOGIES XI, PTS 1 AND 2, 2007, 6517
[9] High power low cost drive laser for LPP source
Fomenkov, Igor V.
Hansson, Bjorn A. M.
Bowering, Norbert R.
Ershov, Alex I.
Partlo, William N.
[J]. EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151 : U1543 - U1551

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