Laser Produced Plasma EUV Sources for Device Development and HVM

被引：6

作者：

Brandt, David C. ^{[1
]}

Fomenkov, Igor V. ^{[1
]}

Lercel, Michael J. ^{[1
]}

La Fontaine, Bruno M. ^{[1
]}

Myers, David W. ^{[1
]}

Brown, Daniel J. ^{[1
]}

Ershov, Alex I. ^{[1
]}

Sandstrom, Richard L. ^{[1
]}

Bykanov, Alexander N. ^{[1
]}

Vaschenko, Georgiy O. ^{[1
]}

Boewering, Norbert R. ^{[1
]}

Das, Palash ^{[1
]}

Fleurov, Vladimir B. ^{[1
]}

Zhang, Kevin ^{[1
]}

Srivastava, Shailendra N. ^{[1
]}

Ahmad, Imtiaz ^{[1
]}

Rajyaguru, Chirag ^{[1
]}

De Dea, Silvia ^{[1
]}

Dunstan, Wayne J. ^{[1
]}

Baumgart, Peter ^{[1
]}

Ishihara, Toshi ^{[1
]}

Simmons, Rod D. ^{[1
]}

Jacques, Robert N. ^{[1
]}

Bergstedt, Robert A. ^{[1
]}

Porshnev, Peter I. ^{[1
]}

Wittak, Christopher J. ^{[1
]}

Woolston, Michael R. ^{[1
]}

Rafac, Robert J. ^{[1
]}

Grava, Jonathan ^{[1
]}

Schafgans, Alexander A. ^{[1
]}

Tao, Yezheng ^{[1
]}

机构：

[1] Cymer Inc, San Diego, CA 92127 USA

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III | 2012年 / 8322卷

关键词：

EUV source; EUV lithography; Laser Produced Plasma; Collector; Droplet Generator;

D O I：

10.1117/12.916521

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Laser produced plasma (LPP) systems have been developed as the primary approach for the EUV scanner light source for optical imaging of circuit features at sub-22nm and beyond nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. We present the latest results on exposure power generation, collection, and clean transmission of EUV through the intermediate focus. Semiconductor industry standards for reliability and source availability data are provided. We report on measurements taken using a 5sr normal incidence collector on a production system. The lifetime of the collector mirror is a critical parameter in the development of extreme ultra-violet LPP lithography sources. Deposition of target material as well as sputtering or implantation of incident particles can reduce the reflectivity of the mirror coating during exposure. Debris mitigation techniques are used to inhibit damage from occuring, the protection results of these techniques will be shown over multi-100's of hours.

引用

页数：9

共 9 条

[1]

[Anonymous], P SPIE

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Hou, Richard R. ;

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