Characteristics of the bipolar resistive switching behavior in memory device with Au/ZnO/ITO structure

被引:8
作者
Wang, Hongjun [1 ]
Zhu, Yuanyuan [1 ,2 ,3 ]
Liu, Yong [2 ,3 ]
机构
[1] Shaanxi Univ Sci & Technol, Dept Phys, Xian 710021, Shaanxi, Peoples R China
[2] Wuhan Univ, Key Lab Artificial Micro & Nanostruct, Minist Educ, Wuhan 430072, Hubei, Peoples R China
[3] Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Hubei, Peoples R China
基金
中国国家自然科学基金;
关键词
ZnO; Resistive switching; Memory; Conducting filament; FILM;
D O I
10.1016/j.cjph.2018.10.019
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In this work, reproducible and stable bipolar resistive switching behavior without the requirement of forming process is observed in the memory device with Au/ZnO/ITO structure. It shows a high R-on/R-o(ff) ratio, where R-on and R-off are the resistance at low resistance state (LRS) and high resistance state (HRS), respectively. The dominated transport mechanisms for LRS and HRS are related to space charge limited current and Ohmic behavior, respectively. This bipolar resistive behavior is attributed to the formation and rupture of conducing filaments which are constructed with oxygen vacancies. The Au/ZnO/ITO device discussed in this work shows huge potential applications in the next generation nonvolatile memory field.
引用
收藏
页码:3073 / 3077
页数:5
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