Challenges of OPC model calibration from SEM contours

被引：12

作者：

Granik, Yuri ^{[1
]}

Kusnadi, Ir ^{[1
]}

机构：

[1] Mentor Graph Corp, San Jose, CA 95131 USA

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXII, PTS 1 AND 2 | 2008年 / 6922卷 / 1-2期

关键词：

OPC; compact process models; OPC model calibration; CD measurements; SEM contours; curve distance; contour-based calibration;

D O I：

10.1117/12.772060

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

Traditionally OPC models are calibrated to match CD measurements from selected test pattern locations. This demand for massive CID data drives advances in metrology. Considerable progress has recently been achieved in complimenting this CD data with SEM contours. Here we propose solutions to some challenges that emerge in calibrating OPC models from the experimental contours. We discuss and state the minimization objective as a measure of the distance between simulation and experimental contours. The main challenge is to correctly process inevitable gaps, discontinuities and roughness of the SEM contours. We discuss standardizing the data interchange formats and procedures between OPC and metrology vendors.

引用

页数：8