Orientation of Ni-Cr thin films with an underlying Ti layer

被引：7

作者：

Iida, A ^{[1
]}

Nakamura, S ^{[1
]}

机构：

[1] TOSHIBA CO LTD,ENVIRONM ENGN LAB,SAIWAI KU,KAWASAKI,KANAGAWA 210,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1996年 / 35卷 / 3A期

关键词：

thin film; Ni-Cr; Ti; HRTEM; preferred orientation;

D O I：

10.1143/JJAP.35.L335

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Insertion of a Ti thin film between an 80 wt% Ni-20 wt% Cr thin film and a glass-coated Al2O3 substrate resulted in a strongly (111) preferred orientation in the Ni-Cr thin film: which was deposited on the Ti layer by continuous sputtering. The preferred orientation and the cross section were observed by X-ray diffractometer (XRD) and high-resolution transmission electron microscopy (RRTEM), respectively. The Ni-Cr thin film was found to have a columnar structure and the column axes were normal to the substrate. In addition, the (111) orientation of Ni-Cr was observed to be almost parallel to the (100) orientation of Ti.

引用

页码：L335 / L337

页数：3

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